2004
DOI: 10.1016/s0038-1101(03)00257-0
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Electrical characteristics of ultra-thin gate oxides (<3 nm) prepared by direct current superimposed with alternating-current anodization

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Cited by 7 publications
(4 citation statements)
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“…As shown in Figure 5, the contact angle of the treated substrate surface was 77.8° at 0 V while the contact angle changed to approximately 60° with 60 V. When putting the stainless steel substrate in the cathode side, the contact angle of the treated substrate surface was 77.8° at 0 V, while the contact angle of the stainless steel substrate declined to 11.06° at −60 V. During the DI water dissociation process, the hydrogen and hydroxyl groups were respectively attracted to the anode and cathode regions by the DC voltage. The formation of the hydrogen and hydroxyl groups by the DC voltage during the DI water dissociation process can be expressed as follows [32]: 2H2OH3O++OH…”
Section: Resultsmentioning
confidence: 99%
“…As shown in Figure 5, the contact angle of the treated substrate surface was 77.8° at 0 V while the contact angle changed to approximately 60° with 60 V. When putting the stainless steel substrate in the cathode side, the contact angle of the treated substrate surface was 77.8° at 0 V, while the contact angle of the stainless steel substrate declined to 11.06° at −60 V. During the DI water dissociation process, the hydrogen and hydroxyl groups were respectively attracted to the anode and cathode regions by the DC voltage. The formation of the hydrogen and hydroxyl groups by the DC voltage during the DI water dissociation process can be expressed as follows [32]: 2H2OH3O++OH…”
Section: Resultsmentioning
confidence: 99%
“…It is observed that is reduced after the anodization treatment as the weak spots and traps in gate oxides are repaired and modified during the anodization process. At the moment of voltage switching, the redistribution and reselection of OH ions, which are frequency-related, will move toward the leaky path and repair the defects in the oxides [10]. The OH ions can only passivate the imperfect dangling bonds in the interface areas related to leaky paths but not interact with the interface areas protected by perfect bulk oxides in the low electric field.…”
Section: Resultsmentioning
confidence: 99%
“…Meanwhile, anodization in DI water is simple. It is expected that the oxide thickness uniformity and the electrical performance of MOS structure solar cells can be further improved by growing oxides with dc superimposed with ac anodization technique, 15 which will be studied in the near future.…”
Section: Methodsmentioning
confidence: 99%