Articles you may be interested inEffects of thermal annealing on deep-level defects and minority-carrier electron diffusion length in Be-doped InGaAsN J. Appl. Phys. 97, 073702 (2005); 10.1063/1.1871334
Electrical field effect of H-implantation induced defect states in GaNThe electrical characterization of He-ion implantation-induced deep levels existing in fully implanted p ϩ n InP junctions isolated by He bombardment is reported in this work. An electron trap located at 0.19 eV below the conduction band and a hole trap located at 0.13 eV above the valence band were detected by deep-level transient spectroscopy ͑DLTS͒. Several emission characteristics of these traps were extracted from the correlation between DLTS and the capacitance-voltage transient technique. The experimental determination of trap capture properties was also carried out. In particular, the capture kinetics was found to exhibit a strong temperature dependence for both centers. Two experimental methods-direct recording of capture transients and analysis of DLTS peaks-were used to estimate the capture parameters. Finally, some tentative arguments are proposed in order to correlate the results obtained from the thermal emission and capture measurements.