1999
DOI: 10.1063/1.369388
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Electrical characterization of a He ion implantation-induced deep level existing in p+n InP junctions

Abstract: Combined optical and electrical studies of the effects of annealing on the intrinsic states and deep levels in a self-assembled InAs quantum-dot structure

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Cited by 2 publications
(8 citation statements)
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“…9͒ eV for samples irradiated with O, all of them below the conduction band. For He irradiations, some authors 1,7 postulated the existence of both donor and acceptor deep levels associated with the He implantation for doses above 5ϫ10 13 cm Ϫ2 and we have experimentally verified this proposal in a recent communication. 13 In particular, we detected by deep-level transient spectroscopy ͑DLTS͒ an electron trap induced by He-ion implantation and its emission properties were investigated.…”
Section: Introductionsupporting
confidence: 73%
See 4 more Smart Citations
“…9͒ eV for samples irradiated with O, all of them below the conduction band. For He irradiations, some authors 1,7 postulated the existence of both donor and acceptor deep levels associated with the He implantation for doses above 5ϫ10 13 cm Ϫ2 and we have experimentally verified this proposal in a recent communication. 13 In particular, we detected by deep-level transient spectroscopy ͑DLTS͒ an electron trap induced by He-ion implantation and its emission properties were investigated.…”
Section: Introductionsupporting
confidence: 73%
“…For He irradiations, some authors 1,7 postulated the existence of both donor and acceptor deep levels associated with the He implantation for doses above 5ϫ10 13 cm Ϫ2 and we have experimentally verified this proposal in a recent communication. 13 In particular, we detected by deep-level transient spectroscopy ͑DLTS͒ an electron trap induced by He-ion implantation and its emission properties were investigated. In every case, the above-mentioned traps determine the electrical properties of the investigated samples and, as they are not in the middle of the band gap, the relatively low values of resistivity obtainable by implantation in both nand p-type InP can be justified.…”
Section: Introductionsupporting
confidence: 73%
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