2010
DOI: 10.1016/j.tsf.2009.07.140
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Electrical characterization of the polyaniline/p-silicon and polyaniline titanium dioxide tetradecyltrimethylammonium bromide /p-silicon heterojunctions

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Cited by 17 publications
(5 citation statements)
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“…This behavior is possibly due to the barrier inhomogeneity and other effects such as inhomogeneities of thickness and nonuniformity of the interfacial charges. 36 This increase of / Bo and decrease of n with increasing temperature was also observed and explained by Boyarbay et al 37 in polyaniline/p-silicon heterojunctions. [38][39][40] The behavior can be explained on the basis of current transport across the metal-semiconductor interface.…”
Section: B Device Characterizationsupporting
confidence: 74%
“…This behavior is possibly due to the barrier inhomogeneity and other effects such as inhomogeneities of thickness and nonuniformity of the interfacial charges. 36 This increase of / Bo and decrease of n with increasing temperature was also observed and explained by Boyarbay et al 37 in polyaniline/p-silicon heterojunctions. [38][39][40] The behavior can be explained on the basis of current transport across the metal-semiconductor interface.…”
Section: B Device Characterizationsupporting
confidence: 74%
“…In other words the increase of the value of n with decrease of temperature is direct result of the bias dependence of the mean barrier and the standard deviation of the Gaussian distribution of barrier heights in Schottky diodes. The Gaussian distribution of the barrier heights and variation of the ideality factor with temperature are expressed by the following equations [41,42]. It is important to point out that the value of is not small compared to value for all the three samples, confirming the presence of the interface inhomogeneties [42].…”
Section: Current-voltage Characteristicsmentioning
confidence: 78%
“…The barrier height can also be determined by rewriting equation (3) The decrease in the ideality factor and the increase in barrier height with the increase of temperature can also be explained on the basis of a thermionic mechanism with Gaussian distribution of barrier heights due to the barrier height inhomogeneities prevailing at organic/inorganic semiconductor interface [41]. In other words the increase of the value of n with decrease of temperature is direct result of the bias dependence of the mean barrier and the standard deviation of the Gaussian distribution of barrier heights in Schottky diodes.…”
Section: Current-voltage Characteristicsmentioning
confidence: 99%
“…High frequency (1MHz) is used to investigate the device capacitance, because the data obtained from the C-V measurement in the low frequencies range represents the sum of the space charge capacitance and the interface capacitance. As the frequency increases, the interface capacitance contribution to the device capacitance decreases [21]. Fig.…”
Section: Capacitance-voltage Characteristicsmentioning
confidence: 95%