1970
DOI: 10.1016/0040-6090(70)90065-9
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Electrical conduction in niobium-niobium oxide-gold diodes

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1976
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Cited by 15 publications
(6 citation statements)
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“…As shown in Fig. 6b , fitting the measured Poole-Frenkel activation energies yields a defect depth of 0.22 eV ± 0.01 eV, in agreement with the previously reported 0.22 eV activation energy for an oxygen vacancy in amorphous Nb 2 O 5 6 .…”
Section: Discussionsupporting
confidence: 90%
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“…As shown in Fig. 6b , fitting the measured Poole-Frenkel activation energies yields a defect depth of 0.22 eV ± 0.01 eV, in agreement with the previously reported 0.22 eV activation energy for an oxygen vacancy in amorphous Nb 2 O 5 6 .…”
Section: Discussionsupporting
confidence: 90%
“…6a is activation of a deep defect state that contributes to the Poole-Frenkel current. Fitting the high temperature activation energy of the Poole-Frenkel Arrhenius plot yields a defect energy of 1.0 eV slightly lower than the reported 1.1 eV second ionization energy of an oxygen vacancy in Nb 2 O 5 6 . Emission from such a deep defect would be extremely slow, resulting in a negligible contribution to current.…”
Section: Discussionmentioning
confidence: 58%
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“…In all devices, two trap levels are present; a deep trap level around ≈1.1 eV below the conduction band and a shallow trap level around ≈0.22 eV below the conduction band, which are attributed to the oxygen vacancies of the amorphous Nb 2 O 5‐ x layer. [ 23 ] The Pt/Ta 2 O 5 /Al 2 O 3‐ y /Ti (PTAT) device missing the Nb 2 O 5‐ x layer did not show memory operation, confirming that the Nb 2 O 5‐ x layer is responsible for the charge trapping. (see Figure S2b , Supporting Information, for the PTAT device I – V data).…”
Section: Resultsmentioning
confidence: 99%