2009
DOI: 10.1016/j.cplett.2008.11.090
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Electrical conductivity measurement of silicon wire prepared by CVD

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Cited by 4 publications
(2 citation statements)
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“…CVD method needs to add Au, Ti, Cu and other metal catalysts. H. Suzuki, et al [4] put a P-type Si plate which had been deposited 2nm Au on the surface into a vacuum reactor and heated to 569K, then the mixture gas composed by pure Ar gas and 10% Si 2 H 6 gas diluted with H 2 were introduced into the chamber. Si atoms and Au atoms which decomposed from Si 2 H 6 formed Au-Si alloy droplets where the SiNWs grown.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%
“…CVD method needs to add Au, Ti, Cu and other metal catalysts. H. Suzuki, et al [4] put a P-type Si plate which had been deposited 2nm Au on the surface into a vacuum reactor and heated to 569K, then the mixture gas composed by pure Ar gas and 10% Si 2 H 6 gas diluted with H 2 were introduced into the chamber. Si atoms and Au atoms which decomposed from Si 2 H 6 formed Au-Si alloy droplets where the SiNWs grown.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%
“…The VLS mechanism really represents the core of silicon wire research, though it works not only for silicon but also for a much broader range of wire materials. The VLS mechanism can be explained on the basis of Au catalyzed Si wire growth on silicon substrates by means of chemical vapor deposition (CVD) using a gaseous silicon precursor such as silane [6].…”
Section: Introductionmentioning
confidence: 99%