potentially to exploit them in spintronics applications. Such potential applications of magnetic vdW materials have recently sparked considerable interest in investigating magnetism of bulk ferromagnetic materials thinned to a single layer [1][2][3][4] or the emergence of ferromagnetism of paramagnetic bulk materials at the monolayer limit. [5,6] In addition, defect-and dopant-induced ferromagnetism has been predicted theoretically. [7][8][9][10][11][12] Recent experimental results suggest that 1T-2H phase boundaries in MoSe 2 , [13][14][15] edges in WS 2 or MoS 2 , [16][17][18][19] adsorbate induced defect states, [20] or substitutional doping of transition metals in 2D materials [21][22][23] can result in defect-or dopant-induced ferromagnetic ordering in these systems. Recently, long-range magnetic order has also been observed in both MoTe 2 and MoSe 2 , which has been suggested to be induced by intrinsic ferromagnetic defects, such as Mo antisites, that is, Mo atoms at chalcogen lattice sites. [24] This indicates that in these materials even dilute defects can cause long-range ferromagnetic ordering, making them promising diluted magnetic semiconductor (DMS) materials. Here, we investigate a new doping mechanism for 2H-MoTe 2 that enables altering the monolayer or surface layer of a MoTe 2 crystal with transition metal impurities. We have recently demonstrated that 2H-MoTe 2 and MoSe 2 can be modified by incorporation of transition metals into the host's interstitial site. [25] We have shown experimentally and by density functional theory (DFT) calculations that excess Mo atoms on MoTe 2 are energetically favored at interstitial sites as compared to adsorbed atoms at the surface. At elevated temperatures, these excess transition metal atoms are mobile and can undergo site-exchange with lattice Mo atoms. For high enough mobility (temperature), the interstitials rearrange into 1D Mo-rich crystal modifications, known as mirror twin grain boundaries. [26][27][28] These grain boundaries have shown no ferromagnetic properties. We demonstrate here, that this doping mechanism can also be expanded to other transition metals, in particular with the goal of inducing magnetism into MoTe 2 . Titanium or vanadium has been used as ferromagnetic dopants in diluted semiconductor systems [29,30] and thus, in this study we explore if V can be introduced into MoTe 2 interstitial Figure 4. Magnetization measurements of MoTe 2 with different V concentrations. a) M-H hysteresis loops taken at 10 K for MoTe 2 with 0.2, 0.3, and 0.8% of V coverage. The variation of the linear diamagnetic background is a consequence of different substrate thicknesses. b) Variation in magnetization saturation with the V concentration. c) Temperature dependences of H C and M S for the 0.8% V-doped sample. The error bars reflect the experimental uncertainty related to background noise. www.advancedsciencenews.com