2019
DOI: 10.3390/mi10100637
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Electrical Coupling and Simulation of Monolithic 3D Logic Circuits and Static Random Access Memory

Abstract: In order to simulate a circuit by applying various logic circuits and full chip using the HSPICE model, which can consider electrical coupling proposed in the previous research, it is investigated whether additional electrical coupling other than electrical coupling by top and bottom layer exists. Additional electrical coupling were verified through device simulation and confirmed to be blocked by heavily doped source/drain. Comparing the HSPICE circuit simulation results using the newly proposed monolithic 3D… Show more

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Cited by 7 publications
(5 citation statements)
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“…Therefore, it is necessary to fully analyze the electrical performance (such as the delay, power, the integration of logic circuits, and the stability of the SRAM considering electrical coupling [11,12] and interface trap charges) when designing M3DIC and M3D memories.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…Therefore, it is necessary to fully analyze the electrical performance (such as the delay, power, the integration of logic circuits, and the stability of the SRAM considering electrical coupling [11,12] and interface trap charges) when designing M3DIC and M3D memories.…”
Section: Discussionmentioning
confidence: 99%
“…When fabricating a circuit with M3DI, the effects of interface trap charges and electrical coupling due to inter-layer dielectric (ILD) distances should be considered. Previous studies investigated electrical coupling with the distance of the ILD when the interface trap charge was ignored [7][8][9][10][11] and extracted SPICE parameters of the monolithic 3D inverter (M3DINV) for the circuit design simulation [12]. However, for a realistic circuit design simulation, it is necessary to extract the SPICE model parameters considering the interface trap charge.…”
Section: Introductionmentioning
confidence: 99%
“…Conventional 3D-IC design approach stacks multiple substrates together with through-silicon-via (TSV) interconnects between substrates. But TSVs occupy significant substrate footprint since their diameter is in the range of 3-20µm, and in addition dummy TSV insertion overhead and keep-out-zone (KOZ) compromise the benefit brought by the vertical integration [1][2][3][4][5][6][7]. On the contrary, the vertical vias in M3D-IC technology are realized by small vias that are in the range of 20nm -100nm known as metal inter-layer via (MIV), thus reducing the silicon footprint consumption significantly compared to conventional 3D-IC approach.…”
Section: Introductionmentioning
confidence: 99%
“…In order to utilize these characteristics, various circuits with the M3D structure were studied [ 10 , 11 , 12 , 13 , 14 , 15 , 16 ]. Particularly, the 6T (or more than six transistors) SRAMs with M3D structure have been proposed and studied to increase density, which can achieve up to a 45% density increase [ 17 , 18 , 19 , 20 , 21 , 22 ].…”
Section: Introductionmentioning
confidence: 99%