“…Vapor deposition is used to prepare thin films of metals, semiconductors, and dielectrics in a vacuum, and it has wide-ranging applications across many fields for the development of functional materials. − Thin-film growth of molecules (e.g., H 2 O, CO, CO 2 , NH 3 , CH 4 , and CH 3 OH) at low temperatures is also key to understanding the formation in cold interstellar regions at around 10 K of icy dust grains, which are the starting material for the evolution of planetary systems. − In 1969, Elliott et al reported the buildup of surface potential during the condensation of water vapor on the surface of a liquid-nitrogen trap . The electrical properties of molecular-solid thin films at low temperatures have been widely investigated for decades, and many polar molecules develop a surface potential during vapor deposition on a cold substrate: for example, H 2 O, − CO, , NO, N 2 O, ,, SO 2 , NH 3 , halocarbons (CHCl 3 , CF 3 Cl, , CF 2 Cl 2 , CFCl 3 , CHCl=CCl 2 , and o -C 6 H 4 Cl 2 ( ortho -dichlorobenzene)), and organic compounds (acetone, , toluene, , propane, isopentane, isoprene, methyl formate, , ethyl formate, 2,5-dihydrofuran, and alcohols (C n H 2 n +1 OH, n = 1–5) including isobutanol ,− ); see also review articles. , N 2 O has been extensively studied by Field and co-workers ,,,− because it exhibits a clear change in its surface potential. A positive surface potential of about +11 V was reported for 355 monolayers (MLs) of polycrystalline N 2 O at 40 K (+32 mV per ML), which corresponds to an electric field of about 10 8 V m –1 . ,, The authors also reported that the substrate temperature strongly affected the development of the surface potential, with a potential of only about +1 V developing for 355 MLs of polycrystalline N 2 O at 65 K.…”