1993
DOI: 10.1007/bf02817519
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Electrical effects of dislocations and other crystallographic defects in Hg0.78Cd0.22Te n-on-p photodiodes

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Cited by 41 publications
(3 citation statements)
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“…While such a fast protocol is capable of producing some crystals of high transparency, it has been shown more recently that decreasing the crystal growth kinetics would be more favorable to improving the optoelectronic properties . Indeed, single crystals with no visible defects can still contain significant amounts of structural defects such as dislocations which were found to be detrimental to charge carrier transport properties in the case of conventional inorganic semiconductors such as Si, Ge, GaAs, or CdTe. By extension, these defects may be one potential root cause of the variability in mobility values reported in the literature for a given HOIP compound (Table S1). In this context, it is of paramount importance to define a robust and reproducible growth protocol leading to HOIP single crystals with low number of structural defects.…”
Section: Introductionmentioning
confidence: 99%
“…While such a fast protocol is capable of producing some crystals of high transparency, it has been shown more recently that decreasing the crystal growth kinetics would be more favorable to improving the optoelectronic properties . Indeed, single crystals with no visible defects can still contain significant amounts of structural defects such as dislocations which were found to be detrimental to charge carrier transport properties in the case of conventional inorganic semiconductors such as Si, Ge, GaAs, or CdTe. By extension, these defects may be one potential root cause of the variability in mobility values reported in the literature for a given HOIP compound (Table S1). In this context, it is of paramount importance to define a robust and reproducible growth protocol leading to HOIP single crystals with low number of structural defects.…”
Section: Introductionmentioning
confidence: 99%
“…This scheme has been successful for short-wave infrared (SWIR) and MWIR FPAs, but it is believed that further reduction in dislocation density, by at least an order of magnitude, is needed for high-performance LWIR HgCdTe FPAs. [4][5][6] In addition, the thermal mismatch between the HgCdTe film and the Si substrate during growth and subsequent device processing is of significant concern. 7, 8 The physical properties of InSb suggest a nearly ideal, alternative substrate for HgCdTe heteroepitaxy.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9] Dislocations threading from the growth substrate and misfits from epitaxial interfaces can all contribute leakage currents that degrade diode performance. For VLWIR FPAs operating at 40 K, dislocations can be major causes of pixel outages.…”
Section: Introductionmentioning
confidence: 99%