“…1a). 11 Experimental observation of such bistability in many materials (including metal oxides and sulphides, amorphous silicon, organic layers with and without embedded metallic grains, and molecular self-assembled monolayers) have been reported in numerous publications starting at least from the 1960s -see an early review 13 and recent reviews. 9,14,15 Moreover, these studies have led to a virtual consensus that the resistive bistability, at least in metal-oxide and amorphous-silicon junctions, 16 is due to the reversible formation and dissolution of one or few highly conducting spots (sometimes called "filaments"), due to field-induced drift of ions (depending on the particular material, either anions or cations) through the amorphous matrix of the layer -see Fig. 1b-d. 9,14,15 Because of this atomic-scale mechanism, the most critical feature of the bistable junctions, especially in the view of their possible applications in VLSI circuits, is the device-to-device reproducibility.…”