Electrical properties of Mg&lt;sub&gt;2&lt;/sub&gt;Si thin films on flexible polyimide substrates fabricated by radio-frequency magnetron sputtering

Tani, Jun; Kido, Hiroyasu

doi:10.2109/jcersj2.123.298

Cited by 19 publications

(2 citation statements)

References 21 publications

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“…Recent studies show that some thin films exhibit thermoelectric performances that are considerably greater than those obtained in bulk materials [29]. To the best of our knowledge, little work has been published about un-doped Mg 2 Si thin-films for thermoelectric applications [33][34][35][36][37].…”

Section: Introductionmentioning

confidence: 99%

Influence of Sputtering Parameters on Structural, Electrical and Thermoelectric Properties of Mg–Si Coatings

et al. 2018

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Mg–Si thin films (23 ≤ at.% Si ≤ 43) were deposited by co-sputtering of Mg and Si targets in an argon atmosphere. Two groups of samples were prepared with respect to sputtering parameters. The first Group I was synthesized while residual pressure in the reactor was lower than 7 × 10−4 Pa and the second Group II when reactor was pumped down to pressure higher than 7 × 10−4 Pa. The Mg2Si phase appeared for all as-deposited films of Group I around the stoichiometric composition region (29 ≤ at.% Si ≤ 37) and in the Mg-rich region (at.% Si < 29) the Mg2Si and Mg phases coexisted. An amorphous structure was obtained for all as-deposited films of Group II no matter their composition (34 ≤ at.% Si ≤ 38) and the Mg2Si structure was achieved after post annealing under air at temperature ≥140 °C. Thermal stability of Mg2Si thin films was investigated by annealing treatments under air. Superficial Mg2Si structural decomposition began at T > 500 °C and layer morphology and structure damaged while annealing temperature increased up to 700 °C. The films’ electrical resistivity, free carrier concentration and mobility as well as Seebeck coefficient were measured and thermoelectric power factors were discussed vs. composition.

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Section: Introductionmentioning

confidence: 99%

Influence of Sputtering Parameters on Structural, Electrical and Thermoelectric Properties of Mg–Si Coatings

et al. 2018

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“…The deposition of Mg-Si films is fabricated by ion beam sputtering [9], Mg2Si thin films are grown on Si(111) by the solid-phase annealing method [10,11]. The thin films are prepared by the radio-frequency magnetron sputtering, and measured the Seebeck coefficient [12]. The thin film is also grown by an industrial rapid thermal annealing [13].…”

Section: Introductionmentioning

confidence: 99%

First Principle Band Calculations of Mg<sub>2</sub>Si Thin Films with (001) and (110) Orientations

et al. 2020

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Advances in Flexible Thermoelectric Materials and Devices Fabricated by Magnetron Sputtering

Shi

Cao

et al. 2023

Small Science

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Due to the direct conversion between thermal and electrical energy, thermoelectric materials and their devices exhibit great potential for power generation and refrigeration. With the rapid development of personal wearable electronics, the design of flexible inorganic thermoelectric materials and devices receives increasing attention. As one of the most mature thin‐film fabrication techniques, magnetron sputtering plays a key role in the fabrication of inorganic thermoelectric thin films and devices, but its progress is still not timely and comprehensively reviewed. Herein, recent advances in magnetron sputtering‐fabricated thermoelectric materials and devices are studied, including their thermoelectric properties, mechanical properties, and device design routes. The differences in the properties of thermoelectric materials under different sputtering conditions, as well as their underlying mechanisms, are carefully discussed. In the end, it is pointed out the challenges and future directions for magnetron sputtering‐prepared inorganic thermoelectric thin‐film materials and devices for practical applications. This review can serve as a useful reference to guide the design of inorganic thermoelectric materials and devices prepared by magnetron‐sputtering‐based deposition techniques.

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Electrical properties of Mg<sub>2</sub>Si thin films on flexible polyimide substrates fabricated by radio-frequency magnetron sputtering

Cited by 19 publications

References 21 publications

Influence of Sputtering Parameters on Structural, Electrical and Thermoelectric Properties of Mg–Si Coatings

Influence of Sputtering Parameters on Structural, Electrical and Thermoelectric Properties of Mg–Si Coatings

First Principle Band Calculations of Mg<sub>2</sub>Si Thin Films with (001) and (110) Orientations

Advances in Flexible Thermoelectric Materials and Devices Fabricated by Magnetron Sputtering

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