1991
DOI: 10.1063/1.105172
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Electrical properties of selectively grown homoepitaxial diamond films

Abstract: Boron-doped homoepitaxial diamond films were selectively grown using sputtered SiO2 as a masking material. Uniform thickness, down to 50 nm, over a large area can be achieved with this technique. Hall mobility of selectively grown films is comparable to that of high-pressure high-temperature synthetic bulk diamond with a corresponding carrier concentration.

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Cited by 55 publications
(8 citation statements)
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“…However, diborane is highly toxic and for this reason several less toxic and more easily handled sources in solid or liquid form have been investigated. Solid sources used for boron doping include boron powder (Grot et al 1991) and boron trioxide (B 2 O 3 ) (Zhang et al 1993). Boric acid (H 3 BO 3 ) (Glesener et al 1993), cyclic organic borinate ester (Zhang et al 1993) and trimethylborate ((CH 3 ) 3 BO 3 ) (Locher et al 1995a) are liquid sources which have been applied sucessfully.…”
Section: In Situ Dopingmentioning
confidence: 99%
“…However, diborane is highly toxic and for this reason several less toxic and more easily handled sources in solid or liquid form have been investigated. Solid sources used for boron doping include boron powder (Grot et al 1991) and boron trioxide (B 2 O 3 ) (Zhang et al 1993). Boric acid (H 3 BO 3 ) (Glesener et al 1993), cyclic organic borinate ester (Zhang et al 1993) and trimethylborate ((CH 3 ) 3 BO 3 ) (Locher et al 1995a) are liquid sources which have been applied sucessfully.…”
Section: In Situ Dopingmentioning
confidence: 99%
“…Diamond films are rarely epitaxial with the substrate except when grown on bulk diamond. However, evidence of heteroepitaxial growth of diamond on substrates with similar cell parameters, e.g., BeO, Si, Ni, Cu, c -BN, and β-SiC1, , has been obtained. By use of the experiences of heteroepitaxial growth of diamond on different substrates, complex composites could be produced that may become more efficient than conventional tools for various industrial applications.…”
Section: Introductionmentioning
confidence: 99%
“…surface transfer doping [1][2][3] have been developed. ptype doping with boron [4] aided with surface transfer doping has helped achieve high performance devices with extremely low activation energy [5]. Still, to date, problems with n-type doping of diamond [6,7] have hindered its development as a ubiquitous device material.…”
Section: Introductionmentioning
confidence: 99%