2008
DOI: 10.1088/0957-4484/19/17/175201
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Electrical sintering of nanoparticle structures

Abstract: A method for sintering nanoparticles by applying voltage is presented. This electrical sintering method is demonstrated using silver nanoparticle structures ink-jet-printed onto temperature-sensitive photopaper. The conductivity of the printed nanoparticle layer increases by more than five orders of magnitude during the sintering process, with the final conductivity reaching 3.7 × 10(7) S m(-1) at best. Due to a strong positive feedback induced by the voltage boundary condition, the process is very rapid-the m… Show more

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Cited by 308 publications
(221 citation statements)
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“…The resistivity of the nanoparticle silver ink is usually 0.30-0.40 m, but in some cases it could be higher than 1 m [29,30]. The sintering process could be one of the reasons of a higher resistivity, as confirmed in the literature [31]. Fig.…”
Section: Preparation Of Sensing Filmsmentioning
confidence: 60%
“…The resistivity of the nanoparticle silver ink is usually 0.30-0.40 m, but in some cases it could be higher than 1 m [29,30]. The sintering process could be one of the reasons of a higher resistivity, as confirmed in the literature [31]. Fig.…”
Section: Preparation Of Sensing Filmsmentioning
confidence: 60%
“…In this method, the sintering is reached by applying a voltage over the printed structure that causes current flow through the structure, leading to a local heating by energy dissipation [39]. The main advantages of this method are the short sintering time (from microseconds to tens of seconds) and reduced substrate heating.…”
Section: Electrical Sinteringmentioning
confidence: 99%
“…Such an annealing of graphene sheets only for short time intervals is also safe for the substrate (even PET and PEN), as the heating is only local and indirect. These methods include Joule heating, [31] microwave irradiation, [12] infra-red heating, [32] and photonic flash annealing. [6,[33][34][35] The latter is a contactless, highly controllable method compatible with highspeed R2R processing and, since it is based on the light absorption, holds great promise for graphene applications.…”
Section: Introductionmentioning
confidence: 99%