Electro-optic deflector isolator for short laser pulse contrast enhancement

Tawney, J.; Richardson, Martin; Adhav, R. S.

doi:10.1109/cleo.2001.947530

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Dynamics Of Droplet Laser Plasmas1

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“…The latter can them be compared to model predictions of the development of the electron density profile, based on the laser light absorption processes, and the electron and radiation transport within the plasma. Interferometry in these experiments has been accomplished by using a sample of the laser beam, up converting it to a higher harmonic (530 nm), and taking a small temporal slice of this beam as the illumination source of the interferometer 14 , Fig.3(a). The original target diameter (dotted ring) was ~ 30 µm dia.).…”

Section: Dynamics Of Droplet Laser Plasmasmentioning

confidence: 99%

Laser plasma EUVL sources: progress and challenges

et al. 2004

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The most pressing technical issue for the success of EUV lithography is the provision of a high repetition-rate source having sufficient brightness, lifetime, and with sufficiently low off-band heating and particulate emissions characteristics to be technically and economically viable. We review current laser plasma approaches and achievements, with the objective of projecting future progress and identifying possible limitations and issues requiring further investigation.

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Section: Dynamics Of Droplet Laser Plasmasmentioning

confidence: 99%