Phone: þ7 495 939 4681, Fax: þ7 495 939 1566A comparative study of structural properties, photoluminescence and electrical conductivity of SiO x N y /SiO 2 , SiO x N y / Si 3 N 4 and SiN x /Si 3 N 4 superlattices is presented. The samples were prepared by plasma enhanced chemical vapor deposition and annealed at 1150 8C in order to produce arrays of silicon nanocrystals, with their formation being confirmed by X-ray diffraction analysis and photoluminescence spectroscopy. Reference samples without silicon nanocrystals were also fabricated by annealing of as-prepared films at a lower temperature (700 8C). All high temperature -annealed samples are characterized by similar photoluminescence spectra with the maxima in the range from 1.3 to 1.6 eV, which were attributed to Si nanocrystals. The peak position, as well as photoluminescence lifetime in the microsecond range, point to the quantum confined origin of the emission. Current-voltage measurements revealed an increase in conductivity by several orders of magnitude for the samples with Si nanocrystals in SiN x /Si 3 N 4 superlattices as compared to both SiO x N y /Si 3 N 4 and SiO x N y /SiO 2 films, as well as to low temperature annealed counterparts. The dependence of the conduction mechanism in superlattices on their structural properties is discussed.