Modeling of the refractive index and composition of luminescent nanometric chlorinated-silicon nitride films with embedded Si-quantum dots

Abstract

The refractive index of nanometric (<100 nm) chlorinated-silicon nitride films with embedded silicon quantum dots, prepared by remote plasma enhanced chemical vapor deposition was investigated by spectroscopic ellipsometry. The complex refractive indexes and thicknesses of the films were obtained from the ellipsometric measurements using the Cauchy model. The chemical composition of the bulk of the films, including the hydrogen, chlorine, and oxygen content, was measured by elastic forward analysis (EFA) and X-ray photoelectron spectroscopy (XPS). The EFA and XPS results indicate that the films are composed of nearly stoichiometric silicon nitride (Si 3 N 4) with different amounts of hydrogen, chlorine, and oxygen, and that their top surface is oxidized. Based on the composition results the refractive index of the films was fitted using the effective medium approximation considering the system: Si substrate þ Si 3 N 4 þ Si þ voids þ top ultrathin oxidized surface layer.

Enhanced Electroluminescence from Silicon Quantum Dots Embedded in Silicon Nitride Thin Films Coupled with Gold Nanoparticles in Light Emitting Devices

“…Additionally, it is possible to identify that Au atoms do not diffuse to the bulk of the SiQDs layer. A content of oxygen is observed at the surface of these samples, which has been attributed to post-deposition reactions, occurred when the films were exposed to ambience [ 36 , 37 ].…”

Experimental Study of the Influence of CH4 and H2 on the Conformation, Chemical Composition, and Luminescence of Silicon Quantum Dots Inlaid in Silicon Carbide Thin Films Grown by Remote Plasma-Enhanced Chemical Vapor Deposition

“…In this regard, remote PECVD (RPECVD) systems are a convenient modification of PECVD systems. , Unlike PECVD, in the RPECVD, the gas dissociations occur in a region far from where the thin film grows. Consequently, nanostructures grown in RPECVD systems show much less plasma-induced damage.…”