Electrochemical co-deposition of gallium and antimonide from the 1-butyl-1-methylpyrrolidinium dicyanamide room temperature ionic liquid

Hsieh, Yi‐Ting; Liu, Yichen; Lo, Nai-Chang; Lin, Wei-Jan; Sun, I‐Wen

doi:10.1016/j.jelechem.2018.10.034

Cited by 13 publications

(9 citation statements)

References 35 publications

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“…This fact was previously observed for Ga in Ref. 28 and references within, but also for other metals deposited from ILs. 22,23 The stripping of the previously deposited metals is often hindered in ILs.…”

Section: Resultssupporting

confidence: 82%

“…After reversing the potential to −2.0 V the current density forms a typical nucleation loop. Similar nucleation loops have been observed for Ga in 1-butyl-1-methylpyrrolidinium dicyanamide ([Py 1,4 ]DCA) 28 and in 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide ([Py 1,4 ]Tf 2 N). 35 However, not only the Ga system shows such nucleation loops, but also other metals and even conducting polymers.…”

Section: Resultssupporting

confidence: 71%

“…22,23 The stripping of the previously deposited metals is often hindered in ILs. This can be due to the inefficient formation of Ga(III) soluble complex ion with the anions of the IL, 28 or due to the fact that the oxidation of Ga occurs at negative potentials, where the anions of the ILs are still strongly repelled from the anode. As a final result, the dissolution process of a Ga film will be hindered.…”

Section: Resultsmentioning

confidence: 99%

“…25 There are only a few literature reports that describe the electrodeposition of Ga-based alloys in ILs. [26][27][28] Copper-gallium bulk codeposits were obtained from reline (a deep eutectic solvent consisting of choline chloride and urea) at 60 °C. 26 Galliumantimonide was electrodeposited in 1-butyl-1-methylpyrrolidinium dicyanamide at 30 °C and 60 °C.…”

mentioning

confidence: 99%

“…26 Galliumantimonide was electrodeposited in 1-butyl-1-methylpyrrolidinium dicyanamide at 30 °C and 60 °C. 28 In 2015 gallium was electrodeposited onto Cu, and successively, Sb was electrolessly deposited on Ga through a galvanic displacement reaction in two different ionic liquids, namely [EMIm]Tf 2 N and [Py 1,4 ]Tf 2 N. 27 In the present paper we studied the electrodeposition of titanium and gallium as individual elements and as alloys on copper and gold substrates from 1-butyl-1-methylpyrrolidinium trifluoromethanesulfonate ([Py 1,4 ]TfO). It is the first study-to the best knowledge of the authors-on the effect of GaCl 3 on the electrodeposition of Ti.…”

mentioning

confidence: 99%

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Electrocodeposition of Titanium and Gallium from 1-Butyl-1-Methylpyrrolidinium Trifluoromethanesulfonate

Borisenko

Ispas

et al. 2020

J. Electrochem. Soc.

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Electrochemical co-deposition of gallium and titanium on copper and gold substrates from the ionic liquid 1-butyl-1methylpyrrolidinium trifluoromethanesulfonate was investigated in the temperature range from 25 °C to 140 °C. Crystalline gallium-titanium alloys were obtained by annealing the deposits at 800 °C for 16 h. X-ray diffraction performed on the annealed specimens confirmed the formation of crystalline phases. In situ quartz crystal microbalance experiments gave further insight into the initial stages of gallium-titanium co-deposition. One can tune the composition of the films by changing the deposition potential or the deposition technique. Gallium rich films (with more than 60 wt%) were obtained by potentiostatic depositions at 140 °C. We could show that no elemental titanium can be electrodeposited from bis(cyclopentadienyl)titanium(IV) bis(trifluoromethanesulfonate) in 1-butyl-1-methylpyrrolidinium trifluoromethanesulfonate. The addition of GaCl 3 to the electrolyte facilitated the reduction of Ti(IV) species.

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Section: Resultssupporting

confidence: 82%

Section: Resultssupporting

confidence: 71%