1993
DOI: 10.1007/bf00331448
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Electrochemical oxidation of La2CuO4 thin films grown by molecular beam epitaxy

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Cited by 25 publications
(13 citation statements)
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“…The strontium-doped films were used to study the doping dependence of the penetration depth [26] and coherence length [27], while the oxygen-doped films were used to demonstrate the electrochemical oxidation of c-axis films [7,28] as well as local electrochemical lithography [8].…”
Section: Methodsmentioning
confidence: 99%
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“…The strontium-doped films were used to study the doping dependence of the penetration depth [26] and coherence length [27], while the oxygen-doped films were used to demonstrate the electrochemical oxidation of c-axis films [7,28] as well as local electrochemical lithography [8].…”
Section: Methodsmentioning
confidence: 99%
“…Hence this compound represents a model system in which oxygen diffusion can be readily studied. We have recently shown that this simple electrochemical process is also applicable for c-axis thin films [7,8,28]. However, we have also speculated that a particular type of microstructural feature is a prerequisite for the proper functioning of the electrochemical oxidation: the presence of planar faults [28].…”
Section: Oxidationmentioning
confidence: 96%
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“…16 Their appearance and density depend mainly on the type of substrate but some variation is observed even among identical substrates. We have recently shown that these defects are excellent channels for oxidation both under electrochemical oxidation conditions 18,25,26 and during standard annealing procedures. The presence of these defects generally leads to well-oxidized thin films, but the variation in planar fault density from sample to sample can cause significant fluctuations.…”
Section: Electrochemical Oxidationmentioning
confidence: 99%
“…[25][26][27] To characterize the electrochemical activity of a film, an I(E) cycle is performed; i.e., a voltage is applied between the sample ͑working electrode͒ and the reference electrode, while the current between the counterelectrode and the working electrode is measured. For a typical 214 thin film grown on STO, the voltammogram of an area (S g ϭ0.8 cm 2 ) between 0.35 and 0.72 V exhibits three different regions ͓Fig.…”
Section: Electrochemical Oxidationmentioning
confidence: 99%