“…A major thrust was realized through the confirmation of the feasibility of electropromotion of thin sputtered metal films [19,20] and the development of the monolithic electrochemically promoted reactor, MEPR [4,20]. Sputtered metal films on un-treated YSZ surfaces, with a thickness of 40-50 nm, were reported to have a metal dispersion higher than 10-20% [20], which is comparable to that of state-ofthe-art conventional supported catalysts.…”