Electrochromic properties of atmospheric CVD MoO3 and MoO3–WO3 films and their application in electrochromic devices

Ivanova, T.; Gesheva, K.A.; Popkirov, G.; Ganchev, M.; Tzvetkova, E.

doi:10.1016/j.mseb.2004.12.084

Cited by 116 publications

(68 citation statements)

References 34 publications

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“…The obtained band gap values of 2.7-2.9 eV are in the range of the values of 2.5-3.0 eV previously reported in the literature. 1,2,36,38 For deposition temperatures of 300 and 350 C, a slightly higher band gap of 2.9 eV than for lower deposition temperatures was found, which is in line with the polycrystalline nature of the material.…”

Section: Optical Propertiessupporting

confidence: 66%

“…[1][2][3][4] Thin films of MoO 3 are being used in gas sensors, 5,6 solid state lithium batteries, 7 and in the synthesis of MoS 2 by sulfurization. 8 Moreover, recently, MoO 3 has been used in organic photovoltaics, 9 perovskite solar cells, 10 and silicon solar cells as hole extraction layer.…”

Section: Introductionmentioning

confidence: 99%

“…Atomic layer deposition of molybdenum oxide from (N t Bu) 2 Molybdenum oxide (MoO x ) films have been deposited by atomic layer deposition using bis(tertbutylimido)-bis(dimethylamido)molybdenum and oxygen plasma, within a temperature range of 50-350 C. Amorphous film growth was observed between 50 and 200 C at a growth per cycle (GPC) around 0.80 Å . For deposition temperatures of 250 C and higher, a transition to polycrystalline growth was observed, accompanied by an increase in GPC up to 1.88 Å .…”

mentioning

confidence: 99%

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Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Vos

Macco

Thissen

et al. 2015

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

120

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Molybdenum oxide (MoOx) films have been deposited by atomic layer deposition using bis(tert-butylimido)-bis(dimethylamido)molybdenum and oxygen plasma, within a temperature range of 50–350 °C. Amorphous film growth was observed between 50 and 200 °C at a growth per cycle (GPC) around 0.80 Å. For deposition temperatures of 250 °C and higher, a transition to polycrystalline growth was observed, accompanied by an increase in GPC up to 1.88 Å. For all deposition temperatures the O/Mo ratio was found to be just below three, indicating the films were slightly substoichiometric with respect to MoO3 and contained oxygen vacancies. The high purity of the films was demonstrated in the absence of detectable C and N contamination in Rutherford backscattering measurements, and a H content varying between 3 and 11 at. % measured with elastic recoil detection. In addition to the chemical composition, the optical properties are reported as well.

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Section: Optical Propertiessupporting

confidence: 66%

Section: Introductionmentioning

confidence: 99%

mentioning

confidence: 99%

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Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Vos

Macco

Thissen

et al. 2015

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

120

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“…The changes in crystal structure that were observed in conjunction with TPR are summarized in Figure 3-4, which compares results from both powder samples and a 200 nm thick film with literature standards. The stable phase of molybdenum oxide has an orthorhombic structure, [36] and the asreceived powders were in good agreement with the literature standards (JCPDS 76-1003).…”

Section: Carburizationsupporting

confidence: 80%

Nanoporous, Metal Carbide, Surface Diffusion Membranes for High Temperature Hydrogen Separations

Way¹,

Wolden²

2013

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Colorado School of Mines (CSM) developed high temperature, hydrogen permeable membranes that contain no platinum group metals with the goal of separating hydrogen from gas mixtures representative of gasification of carbon feedstocks such as coal or biomass in order to meet DOE NETL 2015 hydrogen membrane performance targets. We employed a dual synthesis strategy centered on transition metal carbides. In the first approach, novel, high temperature, surface diffusion membranes based on nanoporous Mo 2 C were fabricated on ceramic supports. These were produced in a two step process that consisted of molybdenum oxide deposition followed by thermal carburization. Our best Mo 2 C surface diffusion membrane achieved a pure hydrogen flux of 367 SCFH/ft 2 at a feed pressure of only 20 psig. The highest H 2 /N 2 selectivity obtained with this approach was 4.9. A transport model using "dusty gas" theory was derived to describe the hydrogen transport in the Mo 2 C coated, surface diffusion membranes. The second class of membranes developed were dense metal foils of BCC metals such as vanadium coated with thin (< 60 nm) Mo 2 C catalyst layers. We have fabricated a Mo 2 C/V composite membrane that in pure gas testing delivered a H 2 flux of 238 SCFH/ft 2 at 600 °C and 100 psig, with no detectable He permeance. This exceeds the 2010 DOE Target flux. This flux is 2.8 times that of pure Pd at the same membrane thickness and test conditions and over 79% of the 2015 flux target. In mixed gas testing we achieved a permeate purity of ≥99.99%, satisfying the permeate purity milestone, but the hydrogen permeance was low, ~0.2 SCFH/ft 2 .psi. However, during testing of a Mo 2 C coated Pd alloy membrane with DOE 1 feed gas mixture a hydrogen permeance of >2 SCFH/ft 2 .psi was obtained which was stable during the entire test, meeting the permeance associated with the 2010 DOE target flux. Lastly, the Mo 2 C/V composite membranes were shown to be stable for at least 168 hours = one week, including cycling at high temperature and alternating He/H 2 exposure.4

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“…This value was also lower than the one obtained from the vacuum deposited (0.6 mA·cm −2 [35]) tungsten trioxide (WO 3 ), and comparable with APCVD (0.02 mA·cm −2 [36]), evaporation-induced self-assembly (0.06 mA·cm −2 [37]), low-pressure CVD (0.08 mA·cm −2 [38]), and hydrothermal (0.04 mA·cm −2 [39]) growth WO 3 . Overall, this APCVD route is advantageous, since it produces higher current density compared with growth techniques which require longer reaction periods and higher substrate temperatures.…”

Section: Cyclic Voltammetrymentioning

confidence: 49%

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Vernardou

2017

Coatings

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Vanadium pentoxide coatings were grown by atmospheric pressure chemical vapor deposition varying the gas precursor ratio (vanadium (IV) chloride:water) and the substrate temperature. All samples were characterized by X-ray diffraction, Raman spectroscopy, scanning electron microscopy, cyclic voltammetry, and transmittance measurements. The water flow rate was found to affect the crystallinity and the morphological characteristics of vanadium pentoxide. Dense stacks of long grains of crystalline oxide are formed at the highest amount of water utilized for a substrate temperature of 450 • C. Accordingly, it was indicated that for higher temperatures and a constant gas precursor ratio of 1:7, the surface morphology becomes flattened, and columnar grains of uniform size and shape are indicated, keeping the high crystalline quality of the material. Hence, it was possible to define a frame of operating parameters wherein single-phase vanadium pentoxide may be reliably expected, including a gas precursor ratio of 1:7 with a substrate temperature of >450 • C. The as-grown vanadium pentoxide at 550 • C for a gas precursor ratio of 1:7 presented the best electrochemical performance, including a diffusion coefficient of 9.19 × 10 −11 cm 2 ·s −1 , a charge density of 3.1 mC·cm −2 , and a coloration efficiency of 336 cm 2 ·C −1 . One may then say that this route can be important for the growth of large-scale electrodes with good performance for electrochromic devices.

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Electrochromic properties of atmospheric CVD MoO3 and MoO3–WO3 films and their application in electrochromic devices

Cited by 116 publications

References 34 publications

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Atomic layer deposition of molybdenum oxide from (NtBu)2(NMe2)2Mo and O2 plasma

Nanoporous, Metal Carbide, Surface Diffusion Membranes for High Temperature Hydrogen Separations

Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

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