“…This compound has a wide band gap around 4.0 eV, is crystalline with cubic structure, and behaves as a p-type semiconductor. Electrochromic layers of these materials can be grown with several deposition techniques such as chemical bath deposition [7,8], spin coating [9,10], sol-gel method [11,12], pulsed laser deposition [13], spray pyrolysis [14,15], electron beam evaporation [16,17], and radio frequency and direct current magnetron sputtering [18,19,20,21]. ECD based on WO 3 and NiO films combined with other TMO can exhibit higher electrochromic properties than those of the individual oxides, making them of the utmost importance for the fabrication of ECD [22].…”