2008
DOI: 10.1016/j.ssi.2008.07.003
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Electrochromism in nickel oxide-based thin films obtained by chemical bath deposition

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Cited by 43 publications
(17 citation statements)
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“…Compared to the CNTF, the I D /I G ratio of the Ni(OH) 2 /CNTF composite is decreased from 1.27 to 0.88, which is perhaps due to the increase in the size of the sp 2 graphitic domains during the preparation process [21]. The 460 cm À1 band can be attributed to the Ni-O(H) stretching mode, while the bands at 327 and 532 cm À1 can be assigned to E u (T) and A 2u (T) lattice vibrations of Ni(OH) 2 [22]. These results further confirm that Ni(OH) 2 has been successfully anchored on the CNTF.…”
Section: Morphology and Structure Characterizationmentioning
confidence: 97%
“…Compared to the CNTF, the I D /I G ratio of the Ni(OH) 2 /CNTF composite is decreased from 1.27 to 0.88, which is perhaps due to the increase in the size of the sp 2 graphitic domains during the preparation process [21]. The 460 cm À1 band can be attributed to the Ni-O(H) stretching mode, while the bands at 327 and 532 cm À1 can be assigned to E u (T) and A 2u (T) lattice vibrations of Ni(OH) 2 [22]. These results further confirm that Ni(OH) 2 has been successfully anchored on the CNTF.…”
Section: Morphology and Structure Characterizationmentioning
confidence: 97%
“…It can be noted that the thin film roughness depends on the annealing temperature with the highest thin film roughness of 47.90 nm at 300 ∘ C. Figure 4 is a plot of the absorbance against the wavelength for the thin-film deposited annealed samples with corresponding optical band gap energy. The optical band gap was obtained, by using the Tauc relation [23]…”
Section: Resultsmentioning
confidence: 99%
“…Lastly, Figure 8 displays the number of effective electrons per formula unit during the absorption process as determined from the sum rule (7). Overall, the extra electron added by the dopant fills the bottom of the conduction band and increases the Fermi level, increasing the number of electrons available for absorption.…”
Section: Optical Absoprtionmentioning
confidence: 99%
“…This compound has a wide band gap around 4.0 eV, is crystalline with cubic structure, and behaves as a p-type semiconductor. Electrochromic layers of these materials can be grown with several deposition techniques such as chemical bath deposition [7,8], spin coating [9,10], sol-gel method [11,12], pulsed laser deposition [13], spray pyrolysis [14,15], electron beam evaporation [16,17], and radio frequency and direct current magnetron sputtering [18,19,20,21]. ECD based on WO 3 and NiO films combined with other TMO can exhibit higher electrochromic properties than those of the individual oxides, making them of the utmost importance for the fabrication of ECD [22].…”
Section: Introductionmentioning
confidence: 99%