Electrodeposited L1₀Co_xPt_1−xnanowires

Abstract

Arrays of face-centred cubic (fcc) CoxPt1 − x (0.45 < x < 0.55) nanowires were electrodeposited into thin film nanoporous alumina supported on a Si substrate. The heat treatment under specific conditions was then carried out in order to transform the fcc phase into the face-centred tetragonal or L10 ordered phase. The influence of both the phase transition and the temperature on the magnetic properties of CoxPt1−x nanowires has been studied. Coercive fields higher than 1 T (10 kOe) have been obtained at room temperature with ordered nanowires, 80 nm in diameter.

Ordered Nanomaterial Thin Films via Supported Anodized Alumina Templates

“…Noble metal nanorods (NR) as well as NR of magnetic alloys were processed using PAAF on various substrates, including Si (Mallet et al, 2005;Piraux et al, 2007;Habouti et al, 2011a,b), glass/ITO (Wurtz et al, 2007;Foong et al, 2008), PDMS (Mátéfi-Tempfli and Mátéfi-Tempfli, 2009), and quartz glass (Habouti and EsSouni, 2014). Electrochemical deposition is best suited for this purpose, because it is easy, cost-effective, and allows a good control of the aspect ratio, and morphology of the nanostructures through control of electrolyte composition, deposition current, and time.…”

“…Recently, a new type of template was proposed that consists of thin anodized aluminum films, a few hundreds of nanometers to a few micrometers thick, supported on solid or flexible substrates (Mallet et al, 2005;Piraux et al, 2007;Wurtz et al, 2007;Foong et al, 2008;Mátéfi-Tempfli and Mátéfi-Tempfli, 2009). In general, the aluminum film is deposited on silicon, glass, or indium-thin oxide (ITO) coated glass wafers that have been pre-coated with a thin adhesion layer (a few nanometers) and a gold (a few tens of nanometers) electrode.…”

“…Anodization, pore opening, and barrierlayer etching are performed in a similar way to bulk aluminum. Supported templates were successfully used in a few reports for the processing of magnetic nano-hetero-structures (Mallet et al, 2005;Piraux et al, 2007;Wurtz et al, 2007), Au-NRs (Wurtz et al, 2007), and Ni-NWs (Foong et al, 2008). In the following, we intend to concentrate on this type of templates because they have promising potential in the processing of large area, wafer size, ordered nanostructure films.…”

Fabrication and Applications of Metal Nanowire Arrays Electrodeposited in Ordered Porous Templates

“…7b). Major benefits this method are that it allows ex-situ annealing temperatures up to 1000 °C [Mallet et al, 2005] and that robust free-standing MNW arrays can be obtained by etching of the thin film template [Matefi-Tempfli et al, 2009]. One of its drawbacks is that high vacuum deposition is required for the growth of Al films as well as several metallic interfacial layers, which typically entails an inert (Au or Pt) film (bottom electrode for electrodeposition) and a buffer layer(s), such as Ti, Nb, etc., used for adhesion and prevention of substrate oxidation via the anodization process.…”

Large-scale synthesis of Au–Ni alloy nanowires using electrochemical deposition

“…Among the various techniques for the growth of nanowires (Kumar et al 2006;Liu and Bando 2003;Liu et al 2008;Mehrez and Guo 2004;Monson and Woolley 2003;Toma et al 2010;Wang et al 2008;Zhang and Wong 2009;Choi and Park 2004;Zhang et al 2008Zhang et al , 2000Zhang et al , 2005Pan et al 2005), electrodeposition is one of the best and a cost effective method (Martin 1994;Lai and Riley 2008;Mallet et al 2005;Gupta and Podlaha 2010;Wong et al 2009). Because using the electrodeposition technique it is very easy to control the thickness of the layers.…”