Electrodeposition behavior of bright nickel in air and water-stable betaine·HCl–ethylene glycol ionic liquid

Gong, Kai; Ye, Hua; Xu, Cunying; Zhang, Qibo; Li, Yan; Ru, Juanjian; Jie, Yafei

doi:10.1016/s1003-6326(15)63862-6

Cited by 15 publications

(8 citation statements)

References 34 publications

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“…Based on the above analysis, the water tolerance of the ChCl-2Urea IL can be determined as below 6 wt.% for electroplating applications, which is much higher than other existing ILs 14 15 . To our best knowledge, the reduction potential of Ni 2+ is negative in various electroplating electrolytes 22 35 36 , therefore, only the ChCl-2Urea IL containing water below such a critical value (i.e. ≤6 wt.%) was considered in the following studies, given the fact that severe decomposition will occur during the course of plating once excessive water is present.…”

Section: Resultsmentioning

confidence: 99%

Effect of water presence on choline chloride-2urea ionic liquid and coating platings from the hydrated ionic liquid

Zhao

Chen

et al. 2016

Sci Rep

156

166

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In the present study, hygroscopicity of the choline chloride-urea (ChCl-2Urea) ionic liquid (IL) was confirmed through Karl-Fisher titration examination, indicating that the water content in the hydrated ChCl-2Urea IL was exposure-time dependent and could be tailored by simple heating treatment. The impact of the absorbed water on the properties of ChCl-2Urea IL, including viscosity, electrical conductivity, electrochemical window and chemical structure was investigated. The results show that water was able to dramatically reduce the viscosity and improve the conductivity, however, a broad electrochemical window could be persisted when the water content was below ~6 wt.%. These characteristics were beneficial for producing dense and compact coatings. Nickel (Ni) coatings plating from hydrated ChCl-2Urea IL, which was selected as an example to show the effect of water on the electroplating, displayed that a compact and corrosion-resistant Ni coating was plated from ChCl-2Urea IL containing 6 wt.% water doped with 400 mg/L NA at a moderate temperature. As verified by FTIR analysis, the intrinsic reason could be ascribed that water was likely linked with urea through strong hydrogen bond so that the water decomposition was suppressed during plating. Present study may provide a reference to prepare some similar water-stable ILs for plating.

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Section: Resultsmentioning

confidence: 99%

Effect of water presence on choline chloride-2urea ionic liquid and coating platings from the hydrated ionic liquid

Zhao

Chen

et al. 2016

Sci Rep

156

166

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“…Ni and its alloys have been studied in many non-aqueous systems, especially in ionic liquids and deep eutectic solvents (DESs) and applied for corrosion protection, catalysis and magnetic devices. [12][13][14][15][16][17][18][19][20][21][22] Particularly, the DESs have been largely studied for use in replacement of water, 8,11,[23][24][25][26] since they are biodegradable, easy to prepare, low sensitive to humidity, besides having an electrochemical window larger than water. [27][28][29][30] Among DESs, special attention has been given to choline chloride (ChCl)-based ones and particularly to two of them, one formed by ChCl and ethylene glycol (ChCl:2EG) and other by ChCl and urea (ChCl:2U), both in a molar proportion of 1:2.…”

Section: Introductionmentioning

confidence: 99%

Electrodeposition Study of Ni Coatings on Copper from Choline Chloride-Based Deep Eutectic Solvents

Urcezino

Santos

Casciano

et al. 2016

J. Braz. Chem. Soc.

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Nickel was electrodeposited from choline chloride (ChCl)-based deep eutectic solvents (DESs) containing ethylene glycol (EG) and urea (U) on Cu substrate. The influence of the temperature and of DESs nature was evaluated. The diffusion coefficients of nickel varied from 2.2 × 10 −9 to 3.7 × 10 −8 cm 2 s −1 for ChCl:2U and from 1.3 × 10 −8 to 5.8 × 10 −8 cm 2 s −1 for ChCl:2EG with increasing temperature. The nucleation process of Ni on Cu at 70 °C was determined as instantaneous in ChCl:2EG and progressive in ChCl:2U using Scharifker and Hills model. The SEM characterization showed that with increasing temperature, more compact coatings were obtained. Linear polarization and electrochemical impedance spectroscopy were used to evaluate the corrosion performance of the obtained deposits in 3.5% NaCl. The coatings were more protective as higher the temperature of deposition, with polarization resistance (R p) values from 3.53 to 19.11 kΩ cm 2 .

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“…Other DES-type ILs were examined Gong et al [80] and Sun et al [74]. Gong Later, the same choline-based mixture was applied by Cherigui et al [72] for electrodeposition of Ni nanostructures onto a glassy carbon electrode.…”

Section: Nickel (Ni)mentioning

confidence: 99%

“…Other DES-type ILs were examined Gong et al [80] and Sun et al [74]. Gong The coatings were obtained at various potentials (Figure 3).…”

Section: Nickel (Ni)mentioning

confidence: 99%

Potential Application of Ionic Liquids for Electrodeposition of the Material Targets for Production of Diagnostic Radioisotopes

2020

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An overview of the reported electrochemistry studies on the chemistry of the element for targets for isotope production in ionic liquids (ILs) is provided. The majority of investigations have been dedicated to two aspects of the reactive element chemistry. The first part of this review presents description of the cyclotron targets properties, especially physicochemical characterization of irradiated elements. The second part is devoted to description of the electrodeposition procedures leading to obtain elements or their alloys coatings (e.g., nickel, uranium) as the targets for cyclotron and reactor generation of the radioisotopes. This review provides an evaluation of the role ILs can have in the production of isotopes.

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Electrodeposition behavior of bright nickel in air and water-stable betaine·HCl–ethylene glycol ionic liquid

Cited by 15 publications

References 34 publications

Effect of water presence on choline chloride-2urea ionic liquid and coating platings from the hydrated ionic liquid

Effect of water presence on choline chloride-2urea ionic liquid and coating platings from the hydrated ionic liquid

Electrodeposition Study of Ni Coatings on Copper from Choline Chloride-Based Deep Eutectic Solvents

Potential Application of Ionic Liquids for Electrodeposition of the Material Targets for Production of Diagnostic Radioisotopes

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