Electrodeposition of [001] oriented TiB2 coatings

Li, Jun; Li, Bing; Dong, Zheng-E

doi:10.1016/j.matlet.2005.05.050

Cited by 12 publications

(8 citation statements)

References 3 publications

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“…0.1 A/cm 2 24 . A similar conclusion was reached by Li et al who showed that the [001] orientation was favored in TiB 2 coatings prepared on graphite substrates using the continuous current and periodically interrupted current methods at 0.6‐0.8 A/cm 2 25 . It is not clear why preferential growth along the [110] axis is observed in the present study.…”

Section: Resultssupporting

confidence: 84%

“…24 A similar conclusion was reached by Li et al who showed that the [001] orientation was favored in TiB 2 coatings prepared on graphite substrates using the continuous current and periodically interrupted current methods at 0.6-0.8 A/cm 2 . 25 It is not clear why preferential growth along the [110] axis is observed in the present study. The TiB 2 crystallite size is similar whatever the deposition time and current density, with a mean value around 20-30 nm (determined using Scherrer formula on the (110) or (100) peak).…”

Section: Resultscontrasting

confidence: 56%

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Electrodeposited TiB₂ on graphite as wettable cathode for Al production

et al. 2020

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Titanium diboride (TiB 2) is considered as a promising cathode material for Al production. However, the manufacture of TiB 2 cathodes is facing numerous challenges. In this study, electrodeposition of TiB 2 on graphite was performed in molten fluoride (FLiNaK) electrolyte at 600°C by using a periodically interrupted current technique for various electrodeposition times (from 10 to 75 minutes) and at two different current densities (−0.12 and −0.5 A/cm 2). It is shown that the TiB 2 coating morphology/microstructure strongly depends on the applied current density. Denser coatings were obtained at j on = −0.12 A/cm 2 with a growth rate of ca. 0.7 µm/min. The thicker films display a preferential crystallographic orientation along the [110] plan. At j on = −0.5 A/cm 2 , TiB 2 coatings are deposited at a growth rate of ca. 6 µm/min with no crystallographic texture. They present a porous and stratified morphology with numerous transversal macrocracks. All TiB 2 coatings show excellent wettability for molten Al as confirmed by sessile drop experiments. However, significant molten Al infiltration occurs in the TiB 2 coatings, which accumulates at the coating/graphite interface, inducing the coating delamination. K E Y W O R D S electrodeposition, primary Al production, TiB 2 coating, wettable cathode 1248 | YVENOU Et al.

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Section: Resultssupporting

confidence: 84%

Section: Resultscontrasting

confidence: 56%

Electrodeposited TiB₂ on graphite as wettable cathode for Al production

et al. 2020

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“…Ref. [137] was focused on the preparation of titanium diboride coatings by electroplating in fluoride-chloride electrolytes (KF-KCl, 94-6 mol%), containing K 2 TiF 6 and KBF 4 (in the molar ratio 1:5, respectively) as the electroactive components. The electroplating was carried out at 800 • C for 60 min.…”

Section: Groupmentioning

confidence: 99%

Electrodeposition of metals from non-aqueous solutions

Simka

Puszczyk

Nawrat

2009

Electrochimica Acta

276

154

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“…Among all the electrolytes reported in the literature [3][4][5][6][7][8], our work was focused on NaCl-KCl-NaF melt due to the high quality of the layers synthesised out of it and the high solubility of the melt in water, which makes easier the washing of the sample after deposition. It is also important for industrial applications that the NaCl-KCl-NaF melt is much less aggressive to the electrochemical cell materials than an all-fluoride electrolyte.…”

Section: Introductionmentioning

confidence: 99%