1975
DOI: 10.1016/0300-9416(75)90063-2
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Electrodeposition of copper on a copper single crystal (111) face in the presence of bromide ions

Abstract: SummaryStudies were made of copper, electrodeposited on to the (100) plane of copper from highly purified solutions of copper sulphate containing known concentrations of iodide ions. For low concentration electrolytes and at low current densities there is a decrease of distance between growth layers. At high current densities and concentrations of iodide ions, there is pitting and the surface corrodes badly.

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Cited by 4 publications
(2 citation statements)
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“…A deposit of triangular pyramids was observed when copper was deposited from the pure solution; as observed by earlier workers [11]. When the concentration of sulphanilamide was 10 12 tool 1 ~ the pyramids became truncated (Fig.…”
Section: Morphology 311 At 2 Ma CMsupporting
confidence: 60%
“…A deposit of triangular pyramids was observed when copper was deposited from the pure solution; as observed by earlier workers [11]. When the concentration of sulphanilamide was 10 12 tool 1 ~ the pyramids became truncated (Fig.…”
Section: Morphology 311 At 2 Ma CMsupporting
confidence: 60%
“…Understanding the process of electrode reaction aids in understanding the mechanism and kinetics of electrolytic crystal growth, as the physical properties of electrodeposits depend on the process of crystals growth. [39] Thermodynamic conditions can predict whether or not the reaction will occur, while the kinetics determine the chemical reaction rates of the desired reactions and side reactions and subsequently influence the composition, structure, and properties of the reaction product. [40] As shown in Fig.…”
Section: Materials Aspectmentioning
confidence: 99%