2015
DOI: 10.1149/2.0451509jes
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Electrodeposition of Copper, Selenium, Indium, and Gallium on Molybdenum/Surface Oxides: Unary, Binary, Ternary and Quaternary Compositions

Abstract: A systematic investigation was performed to study the variation of cyclic voltammetry (CV) peaks during cathodic electrodeposition of unary, binary, ternary and quaternary compositions of copper (Cu), selenium (Se), indium (In) and gallium (Ga) on molybdenum/glass electrode. The major objective of the work was to methodically understand the variation of different oxidation-reduction peaks from unary to quaternary composition so that a comprehensible idea on their appearance could be arrived. The electrodeposit… Show more

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Cited by 12 publications
(16 citation statements)
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“…The standard reduction potential of Ga 3+ /Ga is −0.722 V (vs. Ag/AgCl). During negative going scan, the onset of reduction current appeared at −0.64 V, and a sharp reduction peak of C 1 was found at −0.806 V. 42,45,46 This reduction potential could lead to bulk reduction of Ga 3+ /Ga. The potential for Ga 3+ deposition in this experiment was chosen as −0.75 V, positive from the potential of C 1 .…”
Section: Resultsmentioning
confidence: 98%
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“…The standard reduction potential of Ga 3+ /Ga is −0.722 V (vs. Ag/AgCl). During negative going scan, the onset of reduction current appeared at −0.64 V, and a sharp reduction peak of C 1 was found at −0.806 V. 42,45,46 This reduction potential could lead to bulk reduction of Ga 3+ /Ga. The potential for Ga 3+ deposition in this experiment was chosen as −0.75 V, positive from the potential of C 1 .…”
Section: Resultsmentioning
confidence: 98%
“…The peak C 2 could be possibly by bulk reduction of In 3+ /In on Mo substrate. [42][43][44] From C 2 deposition region, −0.70 V was selected as the potential of E-ALD for In 3+ in this experiment. Figure 4 shows the CV studies of Mo electrode in Gallium (III) solution of 1 mM Ga 2 (SO 4 ) 3 · xH 2 O and 0.1 M Na 2 SO 4 at pH 3.…”
Section: Resultsmentioning
confidence: 99%
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“…Though increasing the concentrations of In(III) and Ga(III) shifts the potential closer to Cu(II) [53], excessive currents generated due to high bath concentrations may cause significant pitting and corrosion of Mo/glass substrates [54]. Recent impedance studies by Saji et al also verified that excessive In ions can interact or complex with Mo/surface oxides and that in effect can cause a certain extent of Mo dissolution [55]. Electrodeposition at high cathodic potential conditions affects the In and Ga plating efficiency due to the parallel occurrence of hydrogen evolution, which is considered to be the origin for film inhomogeneity and pin holes formation.…”
Section: Experimental Concerns In Cigse Electrodepositionmentioning
confidence: 99%
“…Since then, several works on electrodeposition of CISe/CIGSe using TEA have been reported as it can form strong complexes with Cu 2+ and HSeO 2- , and 4.5 mM Se 4+ ions in the bath at a pH of 2.5. The electrolyte was stabilized using a buffer of pH 3 (pHydrion mixture of sulphamic acid and potassium biphthalate) along with LiCl as supporting electrolyte [55]. Recent works by Liu et al have suggested that by increasing the sodium sulfamate concentration, (Cu + Se)/ (In + Ga) decreases, while gallium content increases and the film composition transforms from Cu rich to Cu poor [58].…”
Section: Experimental Concerns In Cigse Electrodepositionmentioning
confidence: 99%