1995
DOI: 10.1016/0040-6090(94)05605-d
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Electrodeposition of metals into porous silicon

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Cited by 153 publications
(117 citation statements)
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“…2 together with the spectrum for the conventional PS for comparison. For the sample prepared with the in situ copper doping, the peak intensity of the SiuOuSi stretching is relatively larger than that of the conventional PS, which is due to the following coupled redox reaction: 3 Oxidation: Siϩ2H 2 O→SiO 2 ϩ4H ϩ ϩ4e Ϫ…”
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confidence: 99%
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“…2 together with the spectrum for the conventional PS for comparison. For the sample prepared with the in situ copper doping, the peak intensity of the SiuOuSi stretching is relatively larger than that of the conventional PS, which is due to the following coupled redox reaction: 3 Oxidation: Siϩ2H 2 O→SiO 2 ϩ4H ϩ ϩ4e Ϫ…”
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confidence: 99%
“…This finding is consistent with the earlier reports that the oxidation of PS occurs simultaneously with metal deposition. 2,3,6 The Si-H x ͑2090-2150 cm Ϫ1 ͒ stretching mode is known to be observed for the freshly etched sample and the H-SiO x stretching mode peaked around 2190-2250 cm Ϫ1 is typical of the aged sample. Other peaks are related to carbon contamination.…”
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“…This is because the PL intensity of PSi can be strongly quenched by metal plating. 18 Magnetic nano-and microparticles have been employed for microfluidic applications, 19 as such particles can be easily manipulated by external magnetic fields from an electromagnet or a permanent magnet. Recently, PSi powders incorporated with magnetic nanoparticles have been used for the manipulation of microliter-scale liquid droplets 20 and for the delivery of nanogram molecular species in fluid.…”
Section: Introductionmentioning
confidence: 99%
“…Under this condition, the metal nuclei grow slowly and form uniform nanoparticles with high-adhesion strength on the porous silicon. 9,20 The reactions between the metal and the porous silicon can be described as: 21 Oxidation: Si + 2H2O → SiO2 + 4H + + 4e -, Reduction: Me z+ + ze -→ Me.…”
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confidence: 99%