2000
DOI: 10.1016/s0924-4247(00)00346-0
|View full text |Cite
|
Sign up to set email alerts
|

Electroforming of 3D microstructures on highly structured surfaces

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
6
0

Year Published

2003
2003
2018
2018

Publication Types

Select...
6
3
1

Relationship

0
10

Authors

Journals

citations
Cited by 17 publications
(6 citation statements)
references
References 4 publications
0
6
0
Order By: Relevance
“…To handle this problem much effort was spent in developing of an electro deposited photo resist process. The resist chosen 6 was originally intended to be used for printed circuit board lithography, but it has also been used for three-dimensional pattering of anistropically etched silicon structures [13], [14]. Exposure of the resist was done with a mask aligner 7 equipped with special optics which enables high resolution (depth of focus) over large topographies.…”
Section: ) Patterningmentioning
confidence: 99%
“…To handle this problem much effort was spent in developing of an electro deposited photo resist process. The resist chosen 6 was originally intended to be used for printed circuit board lithography, but it has also been used for three-dimensional pattering of anistropically etched silicon structures [13], [14]. Exposure of the resist was done with a mask aligner 7 equipped with special optics which enables high resolution (depth of focus) over large topographies.…”
Section: ) Patterningmentioning
confidence: 99%
“…Many groups have successfully transferred a wide variety of patterns to both 2-D [2-17] and 3-D [3,7,8,[18][19][20][21][22][23][24][25][26][27] substrates using microcontact printing. Some innovative 2-D applications resulted in a variety of end uses.…”
Section: Background: Microcontact Printing Has Been Used In a Wide Vamentioning
confidence: 99%
“…In particular, the integration of sensor and actuator elements on surfaces with high aspect ratio microstructures has become of interest, but developments have been limited due to the difficulties that arise in photolithography on such surfaces. 10,11 As an alternative to this, Kutchoukov et al developed a two-step spin coating procedure for conformal coating on ͑100͒ silicon with KOH etched through holes and cavities. These parameters are difficult to control if surface topography of tens to hundreds of microns is present on the substrate surface, which is not uncommon in MEMS fabrication.…”
Section: Introductionmentioning
confidence: 99%