2000
DOI: 10.1016/s0257-8972(99)00423-5
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Electroless nickel plating from acid bath

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Cited by 85 publications
(44 citation statements)
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“…Obviously, phosphorous fraction decreases with the increase of Ce concentration in the plating solutions. Main competitive oxidation-reduction reaction in the acidic hypophosphite plating bath can be expressed as [19]:…”
Section: Methodsmentioning
confidence: 99%
“…Obviously, phosphorous fraction decreases with the increase of Ce concentration in the plating solutions. Main competitive oxidation-reduction reaction in the acidic hypophosphite plating bath can be expressed as [19]:…”
Section: Methodsmentioning
confidence: 99%
“…For example sodium salt and to choice buffering agent depends on pH range used. For pH adjustment such as sulphuric and hydrochloric acids, soda ammonia [7,17,23].…”
Section: Stabilizermentioning
confidence: 99%
“…The properties of electroless nickel are depending on the quantity of phosphorus in the chemical solution [6,17]. Generally, electroless plating process comprising a source of metal ions, complexing agent, reducing agent, stabilizer, buffering agent, wetting agent, controlled pH and temperature [6,7] as represented in Table 2.…”
Section: A Introductionmentioning
confidence: 99%
“…21 However, some studies recently indicated that a highly concentrated nickel bath can decrease the deposition rate. [22][23][24] A number of researchers have all concluded that the rate of deposition increases with an increase in hypophosphite concentration, pH, or temperature, but decreases with increasing complexing agents' concentration. 11,14,21,23 However, most researchers had just described the dependence of rate on various parameters, and not focused on the dynamic equations.…”
Section: Introductionmentioning
confidence: 99%
“…[22][23][24] A number of researchers have all concluded that the rate of deposition increases with an increase in hypophosphite concentration, pH, or temperature, but decreases with increasing complexing agents' concentration. 11,14,21,23 However, most researchers had just described the dependence of rate on various parameters, and not focused on the dynamic equations. 11,14,25,26 Based on a previously proposed mechanism, Malecki et al derived an empirical deposition rate equation in an acid EN plating bath, which agreed well with the experimental results.…”
Section: Introductionmentioning
confidence: 99%