2003
DOI: 10.1007/s11664-003-0235-7
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Electroluminescence and lasing properties of highly Bi-doped PbTe epitaxial layers grown by temperature difference method under controlled vapor pressure

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Cited by 12 publications
(7 citation statements)
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“…The wavelength originating from the band gap also shifts to 5.75 lm at 77 K, corresponding to an energy gap of 27 meV. On the other hand, the donor-acceptor pair binding energy of nearest Bi-Bi lattice sites in PbTe diodes heavily doped with Bi was estimated as 23-28 meV in our previous study [4]. Since both sets of results are in strong agreement, we propose that the peak shift observed in the current study originates from the DA pairs at nearest-neighbor Bi-Bi lattice sites.…”
Section: Methodsmentioning
confidence: 80%
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“…The wavelength originating from the band gap also shifts to 5.75 lm at 77 K, corresponding to an energy gap of 27 meV. On the other hand, the donor-acceptor pair binding energy of nearest Bi-Bi lattice sites in PbTe diodes heavily doped with Bi was estimated as 23-28 meV in our previous study [4]. Since both sets of results are in strong agreement, we propose that the peak shift observed in the current study originates from the DA pairs at nearest-neighbor Bi-Bi lattice sites.…”
Section: Methodsmentioning
confidence: 80%
“…The photocurrent density of the heavily Bi-doped sample is approximately 20 times and 3 times greater than that of the undoped sample and heavily In-doped sample, respectively. Since PbTe systems are characterized by a high electric constant (e = 1400-1800) [11], we previously assumed that the high Bi concentration induced strong self-compensation, reducing the number of free electrons and the wide depletion layer [4,5]. Moreover, the free electrons in the n-type layer absorb less infrared radiation in heavily Bi-doped materials than in the other evaluated materials.…”
Section: Methodsmentioning
confidence: 99%
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“…We have developed the temperature-difference method under controlled vapor pressure (TDM-CVP) liquid phase epitaxy (LPE) [1][2][3][4] for the fabrication of these devices [5][6][7]. Whereas, PbTe and PbSnTe based laser diodes (LDs) have been fabricated using a slow-cooling LPE method [8,9], the difficulties have arisen in accurate control of stoichiometry and alloy compositions, because the growth temperature is changed during epitaxial growth.…”
Section: Introductionmentioning
confidence: 99%