Electron beam induced oxidation of surfaces of Ni3Al-base alloys

Koch, S.A.; Agterveld, D.T.L van; Palasantzas, G.; Hosson, J.Th.M. De

doi:10.1016/s0039-6028(01)00697-5

Cited by 8 publications

(5 citation statements)

References 22 publications

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“…In situ cracking scanning Auger measurements on this specimen [4] showed hardly any boron on the grain boundaries immediately after fracture. However, after the sample had been left in the UHV environment for 24 h, small peaks of B, O and C were observed.…”

Section: Resultsmentioning

confidence: 81%

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Time-of-flight atom probe measurements on Ni3Al and Co3W

2003

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In this study, a VG FIM100 was taken into operation, consisting of a field-ion microscope (FIM), a time-of-flight atom probe (TOFAP) and an imaging atom probe. A tungsten specimen was used to calibrate the conversion of flight times to m/n values. The resulting relative mass resolution of the TOFAP was calculated to be m/Deltam approximately 500 FWHM. In time-of-flight measurements of homemade boron-doped Ni-rich Ni(3)Al, a so-called ladder diagram was constructed from the evaporation data of a <001> pole. This ladder diagram revealed a very high degree of ordering in the alternating pure Ni and mixed Ni/Al planes: only 0.4% of the detected Al atoms were located on pure Ni planes. The number of null pulses to start a new plane was found to be much higher for Ni/Al planes (5 x 10(2)) than for Ni planes (1 x 10(2)). Moreover, the ladder diagram showed that boron was uniformly distributed through the matrix with nearly all boron found on pure Ni-planes. The suggestion that boron preferentially settles on these planes would be supported by reports of a strong Ni-B bond, since on Ni planes, B atoms can be accommodated on octahedral interstitial sites surrounded by only Ni atoms. Finally, we performed time-of-flight measurements on Co(3)W. The ion species observed in these measurements included a wide variety of WN(n)(2+) ions, with 0

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Section: Resultsmentioning

confidence: 81%

“…With the acquisition of both a scanning Auger microscope and an atom probe field-ion microscope it was decided to look into this topic again based on in situ cracking [4] on homemade material. In this paper we present an APFIM study of the boron distribution in boron-doped Ni-rich Ni 3 Al.…”

Section: Introductionmentioning

confidence: 99%

Time-of-flight atom probe measurements on Ni3Al and Co3W

2003

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“…8) reveals oxide layers on the worn surfaces and possible oxide compounds have been monitored as (Fe, Mn) 2 SiO 4 , MnSiO 3 , Mn 3 Al 2 (SiO 4 ) 3 and Cu 2 O(SO 4 ), even though, conventional XRD examination of worn surface is not the sufficient way to identify exact types of the oxide layers. Some of the recent studies [17][18][19][20], which are done by using special equipment particularly for detecting oxide type structures like Auger Electron Microscopy, high-resolution electron microscopy with EDS and X-ray attachment report that Al 2 O 3 is the most possible oxide type observed on the deformed surface of Ni 3 Al at elevated temperatures. Additionally, the types, hardness and portions of oxide layers show differences according to applied parameters such as temperature, loading and speed etc.…”

Section: Discussionmentioning

confidence: 99%

Wear behavior of boron-doped Ni3Al material at elevated temperature

Solmaz

Keleştemur

2004

Wear

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“…The oxidation of Ni 3 Al was described suitably 12 with the model of Li et al 4 This model is based on the premise that the incident electrons create additional nucleation sites a͒ Corresponding author; electronic mail:hossonj@phys.rug.nl around which oxide islands grow. The oxide nucleation sites are likely to be some type of electron rich site similar to F-center anion vacancies created by sputtering a NiO surface.…”

Section: Oxidation Analysis: Discussionmentioning

confidence: 99%

“…Recently, it was shown that an electron beam strongly enhances the oxidation of polycrystalline Ni 3 Al and Ni 3 Al-B surfaces during Auger analysis at room temperature. 12 Upon beam exposure, fast oxide growth proceeds with a negligible O chemisorption regime. Fits of peak-to-peak O curves for Ni 3 Al͑-B͒ surfaces appear to support the model proposed by Li et al 4 which is based on the premise that the electron beam creates additional nucleation sites around which oxide growth occurs.…”

Section: Introductionmentioning

confidence: 99%

Influence of electron flux on the oxidation of Ni3Al surfaces

Palasantzas¹,

Agterveld²,

Koch³

et al. 2001

Journal of Vacuum Science & Technology A: Vacuum, Surfaces,

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Electron beam currents of a few nanoamps, currently used in nanometer scale scanning Auger microscopy scanning electron microscopy, promote oxidation of polycrystalline Ni 3 Al to a degree that depends on the size of the beam and subsequently on the electron flux e . In fact, the oxidation of Ni 3 Al at room temperature follows a model based on the premise that the electron beam creates additional nucleation sites around which oxide growth occurs. With increasing beam size the oxidation process becomes slower and O chemisorption plays a significant role. As a result the Ni-oxide depth decreases drastically with an increasing spot size ͑or equivalently decreasing electron flux͒. It offers an alternative way to monitor the NiO thickness in the nanometer range.

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Electron beam induced oxidation of surfaces of Ni3Al-base alloys

Cited by 8 publications

References 22 publications

Time-of-flight atom probe measurements on Ni3Al and Co3W

Time-of-flight atom probe measurements on Ni3Al and Co3W

Wear behavior of boron-doped Ni3Al material at elevated temperature

Influence of electron flux on the oxidation of Ni3Al surfaces

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