Electron beam lithography inscribed varied-line-spacing and uniform integrated reflective plane grating fabricated through line-by-line method

He, Wei; Zhang, Wenduo; Meng, Fanqi; Zhu, Lianqing

doi:10.1016/j.optlaseng.2020.106456

Cited by 11 publications

(2 citation statements)

References 17 publications

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“…VLS gratings are usually fabricated by holographic recording, electron beam lithography, laser direct writing or mechanical ruling techniques. Traditional direct-write methods such as diamond ruling and electron-beam or laser beam lithography can be extremely slow and expensive and result in gratings with undesired phase errors [5][6][7] . Holographic methods with spherical or aspheric recording optics are rapid and have low high-frequency phase errors.…”

Section: Introductionmentioning

confidence: 99%

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Song,

Zhang,

Liu

et al. 2023

Ninth Symposium on Novel Photoelectronic Detection Technology and Applications

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Section: Introductionmentioning

confidence: 99%

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Song,

Zhang,

Liu

et al. 2023

Ninth Symposium on Novel Photoelectronic Detection Technology and Applications

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“…Diffraction gratings can be classified into two types in terms of pitch distribution; a standard grating having a constant pitch, and a variable-line-spacing (VLS) grating having a variable yet specified pitch distribution [ 5 ]. Both types can be fabricated by mechanical diamond cutting or laser interference lithography techniques [ 6 , 7 , 8 , 9 ]. Recently, the demand for absolute-type optical encoders is increasing, in which a VLS grating serves as a scale for position measurement [ 1 , 10 , 11 ].…”

Section: Introductionmentioning

confidence: 99%

Self-Calibration of a Large-Scale Variable-Line-Spacing Grating for an Absolute Optical Encoder by Differencing Spatially Shifted Phase Maps from a Fizeau Interferometer

Xiong

Yin

Quan

et al. 2022

Sensors

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A new method based on the interferometric pseudo-lateral-shearing method is proposed to evaluate the pitch variation of a large-scale planar variable-line-spacing (VLS) grating. In the method, wavefronts of the first-order diffracted beams from a planar VLS grating are measured by a commercial Fizeau form interferometer. By utilizing the differential wavefront of the first-order diffracted beam before and after the small lateral shift of the VLS grating, the pitch variation of the VLS grating can be evaluated. Meanwhile, additional positioning errors of the grating in the lateral shifting process could degrade the measurement accuracy of the pitch variation. To address the issue, the technique referred to as the reference plane technique is also introduced, where the least squares planes in the wavefronts of the first-order diffracted beams are employed to reduce the influences of the additional positioning errors of the VLS grating. The proposed method can also reduce the influence of the out-of-flatness of the reference flat in the Fizeau interferometer by taking the difference between the measured positive and negative diffracted wavefronts; namely, self-calibration can be accomplished. After the theoretical analysis and simulations, experiments are carried out with a large-scale VLS grating to verify the feasibility of the proposed methods. Furthermore, the evaluated VLS parameters are verified by comparing them with the readout signal of an absolute surface encoder employing the evaluated VLS grating as the scale for measurement.

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Roles of overlapped scratching in grating fabrications assisted by selective wet etching

He,

Lin,

Cui

et al. 2023

J Mater Sci

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Electron beam lithography inscribed varied-line-spacing and uniform integrated reflective plane grating fabricated through line-by-line method

Cited by 11 publications

References 17 publications

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Self-Calibration of a Large-Scale Variable-Line-Spacing Grating for an Absolute Optical Encoder by Differencing Spatially Shifted Phase Maps from a Fizeau Interferometer

Roles of overlapped scratching in grating fabrications assisted by selective wet etching

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