2018
DOI: 10.1016/j.mee.2018.03.016
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Electron beam lithography on uneven resist for uniform Bragg gratings in GaSb based distributed-feedback lasers

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Cited by 4 publications
(2 citation statements)
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“…The masked lithography is suitable for large-area manufacturing by transferring patterns from templates or molds, and includes photolithography [2], soft lithography [3], and nanoimprint [4]. In contrast, maskless lithography can be more flexible in fabricating arbitrary patterns by directly writing or scanning without any mask, including electron beam lithography (EBL) [5], focused ion beam lithography (FIBL) [6,7], and scanning probe lithography (SPL) [8,9]. However, none of the existing techniques can satisfy all the needs at the same time with the nanotechnology developing towards diversification and depth [10].…”
Section: Introductionmentioning
confidence: 99%
“…The masked lithography is suitable for large-area manufacturing by transferring patterns from templates or molds, and includes photolithography [2], soft lithography [3], and nanoimprint [4]. In contrast, maskless lithography can be more flexible in fabricating arbitrary patterns by directly writing or scanning without any mask, including electron beam lithography (EBL) [5], focused ion beam lithography (FIBL) [6,7], and scanning probe lithography (SPL) [8,9]. However, none of the existing techniques can satisfy all the needs at the same time with the nanotechnology developing towards diversification and depth [10].…”
Section: Introductionmentioning
confidence: 99%
“…Thus, how to achieve more complex nanostructures with high accuracy has become a hot issue. At present, various relatively mature techniques have been applied to fabricate nanostructures, mainly including focused ion-beam lithography (FIB) [24,25,26], electron-beam lithography (EBL) [27,28,29,30], ultra-violet lithography (UV lithography) [17,31,32,33,34] etc. However, various factors limit the widely use of these techniques in fabricating nanostructures, ranging from low resolution, high-cost of the equipment, relatively high demand for operation environment to a limited range of materials that can be processed.…”
Section: Introductionmentioning
confidence: 99%