Electron beam nanolithography and testing: ways of increasing the resolution and the throughput

Abstract

The progress of modern nanoelectronics, optoelectronics, nanophotonics, and microoptics is determined mainly by nanolithography advances. The electron beam lithography tools possessing a few nanometers resolution and good flexibility have a good outlook for creation of devices of this type. From the electron beam lithography tools only tools with sharp focused beam may be used for pattern generation over nanoscale area, but the writing speed thereof may decrease dramatically as the beam diameter d is reduced as d --6 over this area. The theoretical analysis showed that the application of electron beam monochromator could not only improve resolution, but increase also the beam current over the minimum diameter area. Numerical modeling of heating process under scanning by electron beam is performed also to fit the electron lithography systems and scanning electron microscopy. Areas of safe work with sensitive to heating samples are determined. A conditions and prospects of development of the various electron beam lithography systems are considered. The achievements of electron beam lithography are compared with success in the field of other lithography techniques.

Contrast improvement with balanced diffusion control of PAG and PDB

“…In lithography, the trend is always moving to smaller features and pushing for practical solutions [1][2][3][4][5] . For semiconductor manufacturing of low-k 1 process, as EUV and e-beam technologies are not yet mature for production [6][7][8] , immersion lithography is indispensable for process development and production 9 .…”