Electron Beam Recorder for Patterned Media Mastering

Abstract

This study proposes an array for a bio-handling system consisting of microcoils on top of photodetectors fabricated by low-temperature polycrystalline-silicon thin-film transistor (LTPS-TFT) technology on a glass substrate. Using magnetic beads as the medium, the proposed system can simultaneously monitor and manipulate micrometer-sized bio-samples. In a manipulation system based on magnetic force, photo-detecting is a reliable method, immune to the interference caused by electromagnetic fields. Under 480 lux ambient white light, the sensor can detect a microbead as small as 23 μm in diameter with detectable output difference. It provides a new, easier way for handling samples on a small chip.

High-Density Electron-Beam Recording of Circumferentially Aligned Dots by Using Substrates with Low Atomic Numbers

“…Circumferentially aligned patterns were defined by using an electron-beam recorder with a rotary stage (Pioneer, EBR-401). 18) The rotating stage was translated in a radial direction, while the substrate was exposed by a point electron beam (15 nA) with an acceleration voltage of 100 kV to record concentric patterns. The exposed resist film was developed in n-amyl-acetate (Nippon Zeon, ZED-N50) at a temperature of À10 C for resolution enhancement.…”

“…In addition, there are only few reports on high-density circumferentially aligned patterns that are essential for patterned media fabrications. [16][17][18] Conventional electronbeam writing systems with x-y stages cannot be used because patterned media applications have a very low tolerance to stitching errors. We have developed an electron-beam recorder with a rotary stage [18][19][20][21] and demonstrated high-density, circumferentially aligned dot-array patterns with areal densities up to 573 Gbit/in.…”

Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process

“…an electron-beam recorder with a rotary stage (Pioneer EBR-401). 26) The rotating stage was translated to a radial direction, whereas the substrate was exposed to a point electron beam (15 nA) with an accelerating voltage of 100 kV to record concentric patterns. For patterned media applications, servo patterns were also embedded using an ''IMES standard format''.…”

“…For patterned media applications, servo patterns were also embedded using an ''IMES standard format''. 26) The exposed resist film was developed in n-amyl acetate (Nippon Zeon ZED-N50) at À10 C for resolution enhancement. [27][28][29][30][31] After the development, undercut profiles were formed in the trilayered stack (ZEP/HSQ/resin) using an inductively coupled plasma reactive ion etching (ICP-RIE) system (ULVAC NE730) in the ''undercut and liftoff'' process.…”

Preparation of Ultrahigh-Density Magnetic Nanowire Arrays beyond 1 Terabit/Inch2 on Si Substrate Using Anodic Aluminum Oxide Template

“…Owing to a strong demand for high-density magnetic recording, perpendicular magnetic recording such as patterned media has attracted considerable attention. [1][2][3] Magnetic nanowire arrays buried in a self-organized array of an anodic aluminum oxide (AAO) template by electrodeposition is one of the candidates for high-density storage media with perpendicular magnetic recording. [4][5][6][7][8][9][10][11] The AAO is known to have ordered honeycomb nanopore arrays under self-organized condition, so it is used as a template for fabrication of nanostructures aligned perpendicular to the surface of a substrate.…”