2008
DOI: 10.1017/s1431927608086856
|View full text |Cite
|
Sign up to set email alerts
|

Electron Channeling and Ion Channeling Contrast Imaging of Dislocations in Nitride Thin Films

Abstract: Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

1
0
0

Year Published

2010
2010
2012
2012

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 1 publication
1
0
0
Order By: Relevance
“…6) also showed “dark line” features that are evidence of diffraction contrast from dislocations and other line defects in the crystals. This assumption is consistent with earlier observations that secondary electron images generated by the He + ion beam from crystalline materials display strong channeling contrast between grains, as well as from stacking faults and dislocation arrays (Bernheim, 1973; Trager-Cowan et al, 2008). This ability of the HIM to image crystal defects in both bulk and thin samples at high contrast and resolution will be of significant value in materials science.…”
Section: Resultssupporting
confidence: 92%
“…6) also showed “dark line” features that are evidence of diffraction contrast from dislocations and other line defects in the crystals. This assumption is consistent with earlier observations that secondary electron images generated by the He + ion beam from crystalline materials display strong channeling contrast between grains, as well as from stacking faults and dislocation arrays (Bernheim, 1973; Trager-Cowan et al, 2008). This ability of the HIM to image crystal defects in both bulk and thin samples at high contrast and resolution will be of significant value in materials science.…”
Section: Resultssupporting
confidence: 92%