“…Because of the small size of these rod-like defects, these authors were unable to determine the habit plane between them and the de silicon matrix. However, because of the similarity of the hexagonal/cubic orientation relationship in the two cases, Tan et al [7] assumed that the implantation-induced defects had the same {115}dc habit plane as the indentation-induced dh silicon reported by Eremenko and Nikitenko [6]. Tan et al [7] further repeated the experiments of the Soviet workers and confirmed all their findings.…”