2021
DOI: 10.1134/s1063782621070150
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Electron Mobility in Bulk n-Doped SiC-Polytypes 3C-SiC, 4H-SiC, and 6H-SiC: A Comparison

Abstract: This communication presents a comparative study on the charge transport (in transient and steady state) in bulk n-type doped SiC-polytypes: 3C-SiC, 4H-SiC and 6H-SiC. The time evolution of the basic macrovariables: the "electron drift velocity" and the "non-equilibrium temperature" are obtained theoretically by using a Non-Equilibrium Quantum Kinetic Theory, derived from the method of Nonequilibrium Statistical Operator (NSO). The dependence on the intensity and orientation of the applied electric field of thi… Show more

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Cited by 5 publications
(3 citation statements)
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“…In the homogeneous epitaxial growth process of SiC, the mechanism of N atom doping competes for lattice positions with C atoms. 22 If the concentration of C elements in the gas increases, the competitive ability of N atoms with C atoms decreases, resulting in a decrease in doping concentration. With an increase in the concentration of source gas, the concentration of C atoms within the boundary layer increases.…”
Section: Resultsmentioning
confidence: 99%
“…In the homogeneous epitaxial growth process of SiC, the mechanism of N atom doping competes for lattice positions with C atoms. 22 If the concentration of C elements in the gas increases, the competitive ability of N atoms with C atoms decreases, resulting in a decrease in doping concentration. With an increase in the concentration of source gas, the concentration of C atoms within the boundary layer increases.…”
Section: Resultsmentioning
confidence: 99%
“…The mobility of electrons and holes is one of the most basic physical parameters, and the low mobility of the inversion layer is a significant shortcoming of SiC MOSFET, which greatly influences the device's performance [13].…”
Section: Effect Of Temperature On Mobilitymentioning
confidence: 99%
“…There is much research on it. For example, WM Choi and HG Ahn studied SiC-based power semiconductor system[4], Zhi Peng Luo studied the annealing effects on the reliability and performance of SiC MOS capacitance[5], and Zhi Qiang Bai studied the effects of temperature storage on the threshold voltage stability of n-channel 4H-SiC VDMOSFET [13]. These studies are valuable but not comprehensive enough.…”
mentioning
confidence: 99%