Electron-stimulated desorption of F+ and F− from SF6 on Ru(): structure and bonding

Faradzhev, N. S.; Kusmierek, D. O.; Yakshinskiy, B. V.; Соловьев, С. М.; Madey, Theodore E.

doi:10.1016/s0039-6028(02)02605-5

Cited by 10 publications

(22 citation statements)

References 22 publications

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“…In spite of the fact that the cracking pattern of ESD for negative ions contains only a few fragments, we observe the same tendency [5] as for positive ions. Sample bias is + 20V.…”

Section: Esd Mass-spectrasupporting

confidence: 46%

“…The QMS filament provides a defocused electron beam that allows for irradiation of the whole sample, in contrast to the electron gun with a focused electron beam that irradiates~1 mm 2 of the target sample. TPD measurements [5] indicate that the SF 6 molecules are primarily physisorbed on the Ru substrate. We estimate a constant sticking probability (~1) for SF 6 at 25 K [5].…”

Section: Methodsmentioning

confidence: 99%

“…TPD measurements [5] indicate that the SF 6 molecules are primarily physisorbed on the Ru substrate. We estimate a constant sticking probability (~1) for SF 6 at 25 K [5]. Based on the packing density of the basal plane of ruthenium (1.58·10 15 atoms/cm 2 ), and the molecular size of SF 6 , we identify the saturation coverage of SF 6 in the first adsorbed layer as~0.33 ML (5.3·10 14 molecules/cm 2 ).…”

Section: Methodsmentioning

confidence: 99%

“…This study has several components, including: 1) the study of the structure and reactivity of SF 6 on a clean Ru(0001) [5] surface; 2) the influence of coadsorbed atoms and molecules in ESD of SF 6 (including a search for enhancement of the F -ESD signal [1][2][3]); 3) electron beam damage processes in the adsorbed layer. The present paper focuses on the latter: the effects of electron bombardment on the structure and bonding of SF 6 , as revealed by changes in F + and F -ESD yields and angular distributions.…”

Section: Introductionmentioning

confidence: 99%

“…In this paper we concentrate on both F + and F -ions produced by ESD of a fractional SF 6 layer (0.25 ML) adsorbed on a Ru(0001) substrate (because of the high electron affinity of the F atom, we expect a strong F -signal in ESD). In the gas-phase, the low-energy dissociative electron attachment (DEA) resonance that leads to F -formation is due to the reaction e -(2.7eV) + SF 6 ® F -+ SF 5 .…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Effects of electron irradiation on structure and bonding of SF6 on Ru(0001)

Faradzhev

Kusmierek

Yakshinskiy

et al. 2003

Low Temperature Physics

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Electron-stimulated desorption ion angular distribution (ESDIAD) and temperature-programmed desorption (TPD) techniques have been employed to study radiation-induced decomposition of fractional monolayer SF6 films physisorbed on Ru(0001) at 25 K. Our focus is on the origin of F+ and F− ions, which dominate ESD from fractional monolayers. F− ions escape only in off-normal directions and originate from undissociated molecules. The origins of F+ ions are more complicated. The F+ ions from electron-stimulated desorption of molecularly adsorbed SF6 desorb in off-normal directions, in symmetric ESDIAD patterns. Electron beam exposure leads to formation of SFx (x=0–5) fragments, which become the source of positive ions in normal and off-normal directions. Electron exposure >1016 cm−2 results in decomposition of the entire adsorbed SF6 layer.

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“…In spite of the fact that the cracking pattern of ESD for negative ions contains only a few fragments, we observe the same tendency [5] as for positive ions. Sample bias is + 20V.…”

Section: Esd Mass-spectrasupporting

confidence: 46%

Section: Methodsmentioning

confidence: 99%