1992
DOI: 10.1103/physrevb.45.13509
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Electron transport at metal-semiconductor interfaces: General theory

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Cited by 1,429 publications
(1,153 citation statements)
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References 71 publications
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“…4(a), the potential in the depletion region under the metal dot is greatly modified by the influence of the environmental Fermi-level pinning, resulting in the formation of a saddle point potential at depth of several 10 nm from the MS interface. This is similar to the situation in inhomogeneous Schottky interfaces discussed by Tung 7) . This potential modification should change the effective barrier height of the nano-Schottky contacts.…”
Section: Theoretical Analysis Of Electrical Propertiessupporting
confidence: 64%
“…4(a), the potential in the depletion region under the metal dot is greatly modified by the influence of the environmental Fermi-level pinning, resulting in the formation of a saddle point potential at depth of several 10 nm from the MS interface. This is similar to the situation in inhomogeneous Schottky interfaces discussed by Tung 7) . This potential modification should change the effective barrier height of the nano-Schottky contacts.…”
Section: Theoretical Analysis Of Electrical Propertiessupporting
confidence: 64%
“…[181] Inhomogeneities in MIS interfaces can easily dominate net transport across them. [151,152] This is found even at the nanoscopic level. Thus, the conductance of isolated styrene [27] or acetone [182] molecules, adsorbed on Si, is affected strongly by the chemical conditions of neighboring Si atoms, which act as gate for transport across the adsorbed molecules.…”
Section: Imperfections In the Monolayermentioning
confidence: 93%
“…[44,63,90,150] SBH(J 0 ) < SBH(C 0 ) suggests an inhomogeneous barrier. [151,152] Surprisingly, for Hg/alkyl-n-Si MOMS SBH(J 0 ) $SBH(C 0 )) [19,135] but this is simply because both the width of the space charge (C 0 ) and the semiconductor transport (J 0 ) saturate at similar values (strong inversion). In any case, SBH > E G /2 presents strong support for inversion.…”
Section: Extraction Of the ''Semiconductor Barrier Height'' (Sbh)mentioning
confidence: 99%
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“…A typical J -V characteristic of evaporated Ni-Si, SBs, with Si resistivity of [10][11][12][13][14][15][16][17][18][19][20] cm is also shown in Fig. 1 for comparison.…”
Section: Resultsmentioning
confidence: 99%