“…Generally, a positive barrier is formed at the surface; however, it is also possible to produce negative charge barrier near to the positively biased electrode. In recent years, many experimental and theoretical works on electronegative plasma sheath with different models have been reported (Kono 2003, Hatami, Shokri & Niknam 2008, Shaw, Kar, & Goswami 2012, Jing-ju, Ma & Wei 2013, Basnet, Patel & Khanal, 2020 but still, it is not fully understood. It has applications in diverse fields such as plasma etching, surface treatment, ion implantation, fabrication of semiconductor devices, etc.…”