The Si͑100͒-c͑4 ϫ 4͒ surface prepared by various methods has been studied using high-resolution electron energy loss spectroscopy ͑HREELS͒, scanning tunneling microscopy ͑STM͒, and low-energy electron diffraction ͑LEED͒ at 100 and 300 K. Unlike Si͑100͒-͑2 ϫ 1͒, the c͑4 ϫ 4͒ surface does not undergo any phase transition by cooling down to 100 K. In HREELS measurements at 100 K, a loss peak correlated with the appearance of the c͑4 ϫ 4͒ surface is observed at 95 meV. The appearance of 95 meV peak is independent of the surface preparation methods. The 95 meV peak is ascribed to the surface Si-C species involved in the Si͑100͒-c͑4 ϫ 4͒ reconstruction. Thus, the STM and HREELS results suggest that the C atoms in the c͑4 ϫ 4͒ surface are located at the surface layer forming Si-C dimers. When the c͑4 ϫ 4͒ periodicity is broken by annealing at 1100 K, the silicon carbide ͑SiC͒ islands are observed on the surface. Based on the analysis of STM images and HREELS results, a model consisting of Si-C and Si-Si dimers is proposed for the Si͑100͒-c͑4 ϫ 4͒ surface. The consistencies of the proposed models with the reported experimental results are discussed.