2011
DOI: 10.1007/978-1-4419-8164-6
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Electronic Properties of Materials

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Cited by 104 publications
(52 citation statements)
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“…11 A critical requirement for producing outstanding catalysts in a photoelectrochemical cell is not only 40 the ability to boost the kinetics of electrochemical reaction but also the ability to resist electrochemical and photoinduced degradation. Herein, we demonstrate that the combination of controlling a nanostructure of the photoelectrode and using a carbon-based hydrogen evolution catalyst represents a significant 45 step toward enhancing the applied bias photon-to-current efficiency (ABPE). In the present work, a 430 mV decrease in overpotential was achieved using graphene quantum sheets on a silicon nanowire, which exhibited an enhancing effect comparable to that of platinum catalysts.…”
Section: Introductionmentioning
confidence: 99%
“…11 A critical requirement for producing outstanding catalysts in a photoelectrochemical cell is not only 40 the ability to boost the kinetics of electrochemical reaction but also the ability to resist electrochemical and photoinduced degradation. Herein, we demonstrate that the combination of controlling a nanostructure of the photoelectrode and using a carbon-based hydrogen evolution catalyst represents a significant 45 step toward enhancing the applied bias photon-to-current efficiency (ABPE). In the present work, a 430 mV decrease in overpotential was achieved using graphene quantum sheets on a silicon nanowire, which exhibited an enhancing effect comparable to that of platinum catalysts.…”
Section: Introductionmentioning
confidence: 99%
“…Figure 1 shows the temperature (T ) dependence of the resistivity along the c-axis (ρ c ) at various pressures. The behaviors at 0.13 and 0.29 GPa are typical of extrinsic semiconductors [10,15]. In the high-temperature region between 300 and 200 K, the resistivity increases as the temperature decreases, which can be regarded as a reduction in the number of carriers that are thermally activated via the excitation across the band gap.…”
Section: Methodsmentioning
confidence: 97%
“…However, it should be noted that the free carriers effect in the semiconductor could be accelerated under the infl uence of an electric fi eld. [ 32 ] The Hall effect measurements were conducted to investigate the dopant-type and carrier concentrations of the as-synthesized MoS 2 NFs. The result revealed that the electron mobility and electron concentration are ≈12.9 cm 2 V −1 s −1 and 4.04 × 10 15 cm 3 , respectively, demonstrating that the MoS 2 NFs belongs to an n-type semiconductor behavior.…”
Section: Doi: 101002/adma201505785mentioning
confidence: 99%