Electrophoretic Deposition of Lead Zirconate Titanate Films on Metal Foils for Embedded Components

Abstract

Lead zirconate titanate (PZT) thick films in the thickness range of 5-200 lm on 20 lm copper and 25 lm platinum foils were prepared by electrophoretic deposition (EPD) for application as embedded passive components. The EPD process was conducted in glacial acetic acid medium, and the effects of deposition parameters, such as dc voltage values, processing times, and suspension aging on the film thickness and composition stoichiometry were evaluated. The dependence of the film thickness on the current and aging of the suspension was established and correlated to the chemical modifications occurring in the suspension. Films sintered at 11501C for 30 min exhibited uniform and dense microstructures with an average grain size of 1.5 lm. A dielectric permittivity of around B1330 and loss tangent of 0.05 were measured for films with 8 lm of thickness. The films showed remanent polarization and a maximum polarization value of 24 and 38 lC/cm 2 , respectively. These properties, comparable with those of bulk PZT ceramics, suggested potential applications of the EPD process for the deposition of ferroelectric thick films on metal foils for embedded component applications.

Fabrication of pyrochlore-free PMN–PT thick films by electrophoretic deposition

“…For the fabrication of films with thicknesses varying from 5 to 50 m, bulk ceramic and thin film processes are not technically and economically recommended, the use of ceramic thick film technologies being necessary [6]. Among the thick film production processes, tape casting and screen printing have been widely employed for the preparation of thick layers of ferroelectric materials, like PMN-PT [7,8].…”

Sinterização de filmes espessos de Ba(Ti0,85Zr0,15)O3 por varredura laser

“…Materiais ferroelétricos produzidos na forma de filmes espessos (>10 µm de espessura) têm sido utilizados em transformadores de impedância, micro-atuadores, sensores piezelétricos [7][8][9] e no desenvolvimento de MEMS (microelectromechanical systems) devido a sua alta sensibilidade e amplo intervalo de freqüência de trabalho quando comparados aos filmes finos [8,9]. Entre os materiais viáveis para estas aplicações, o Ba(Ti 1-x Zr x )O 3 é um dos candidatos por apresentar propriedades elétricas sintonizáveis com alterações na quantidade de Zr na composição química das cerâmicas [10,11].…”

Thick Film Laser Sintering: An Evidence for Two-step Process

“…Research on ferroelectric and piezoelectric thick films (thickness above 20 m) is of fundamental importance for the development of microelectromechanical systems (MEMS) due to its higher sensitivity, larger mechanical force and broader working frequency range when compared to thin films [1][2][3]. One of the most versatile techniques for thick films production is the electrophoretic deposition (EPD).…”

“…The process starts from liquid suspensions of nanometer size powders that are deposited through the application of direct current (DC) potentials. This method employs the phenomenon of the movement of colloidal particles suspended in a medium when subjected to an electric field [2,3].…”