Electrophoretic deposition of titanium nitride coatings

Abstract

Electrophoretic deposition of the titanium nitride (TiN) coatings from suspensions prepared by dispersion of TiN particles in triethanolamine (TEA) containing butanol medium was studied. Effects of the TiN particles concentration (C TiN ) on the weight of the deposited coatings, triethanolamine concentration (C TEA =0.25, 0.5, 0.75, and 1 mL/L) on the Zeta potential of the TiN particles, suspension electrical conductivity and pH, as well as effects of the deposition voltage (V d =60, 90, and 120 V) and time (t d =1, 2, and 3 minutes) on the microstructure and thickness of the deposited coatings were investigated. Variations in deposition current density, effective deposition voltage, electrical resistance, and deposited coating weight versus deposition time were recorded. The morphology of the as-dried coatings was studied using Scanning Electron Microscope (SEM). The results indicated that by increasing the C TiN the weight of deposits increases linearly up to 40 g/L. For suspensions containing C TiN =40 g/L, the optimum C TEA is obtained to be 0.5 mL/L leading to Zeta potential of 43.25 mV. Uniform and crack-free as-dried coatings obtained at V d and t d of 90 V and 2 minutes, respectively. K E Y W O R D Scoating, electrophoretic deposition, microstructure, sticking factor, titanium nitride

Advances in the control of electrophoretic process parameters to tune the ytterbium disilicate coatings microstructure

“…The value of the sticking factor decreases with the deposition time. It could be related to the growth of the electrically resistant layer on the surface electrode 40 . The reduction is more important for [I 2 ] = 0.1 g/L than without iodine, following the trend of the decrease of the effective electric field (Figure 3D).…”

“…It could be related to the growth of the electrically resistant layer on the surface electrode. 40 The reduction is more (16) important for [I 2 ] = 0.1 g/L than without iodine, following the trend of the decrease of the effective electric field ( Figure 3D). Until 180 seconds of deposition time, the f factor is lower for the suspension without iodine, than the one with 0.1 g/L; this is due to the growth of the electrically resistant layer on the surface substrate which is higher for the coating without iodine.…”

Surface Optimization of Commercial Porous Ti Substrates by EPD of Titanium Nitride

“…XRD profiles of both TiN samples show reflections which are assigned all to the (111), (200), (220), (311), (222), and (400) crystal planes corresponding to a fm-3m face centered cubic phase, (space group 225, JCPDS 38–1420) [ 56 ]. No other peaks related to other secondary phases are present in the spectra.…”

“…Despite the simplicity of the technique, very few studies report the deposition of TiN coatings by EPD and all are devoted to the preparation of protective films on dense substrates. Among these, some works are focused on the deposition of TiN coatings on dense stainless steel as protective corrosion layer for bipolar plates of polymer electrolyte fuel cells [ 53 , 54 , 55 , 56 , 57 ]. A couple of papers report the EPD deposition of TiN coatings on dense Ti substrates.…”

“…Isopropanol was also used as media for the preparation of TiN-based suspensions on stainless steel substrates by EPD [ 53 , 55 ]. Kavanlouei deposited TiN coatings on stainless steel discs by using butanol as solvents and tri-ethanolamine as dispersant agent [ 56 ]. Lee used suspensions in anhydrous ethanol in the presence of PEI and poly(diallyldimethylammonium chloride) as stabilizers [ 54 ].…”