The van-der-Waals stacking technique enables the fabrication of heterostructures, where two conducting layers are atomically close. In this case, the finite layer thickness matters for the interlayer electrostatic coupling. Here we investigate the electrostatic coupling of two graphene layers, twisted by θ = 22 • such that the layers are decoupled by the huge momentum mismatch between the K and K' points of the two layers. We observe a splitting of the zero-density lines of the two layers with increasing interlayer energy difference. This splitting is given by the ratio of single-layer quantum capacitance over interlayer capacitance Cm and is therefore suited to extract Cm. We explain the large observed value of Cm by considering the finite dielectric thickness dg of each graphene layer and determine dg ≈ 2.6Å. In a second experiment we map out the entire density range with a Fabry-Pérot resonator. We can precisely measure the Fermi-wavelength λ in each layer, showing that the layers are decoupled. We find that λ exceeds 600 nm at the lowest densities and can differ by an order of magnitude between the upper and lower layer. These findings are reproduced using tight-binding calculations. arXiv:1907.00582v1 [cond-mat.mes-hall] 1 Jul 2019 2 a b c d C hBN hBN 2xGraphene Graphite topgate C 2. 2μ m 2 . 3 μ m 3.5nm K b K' b θ K t K' t Sample A Sample B FIG. 1. a) Top-view and side-view of two aligned layers of graphene that are decoupled in the middle (blue part) by a thin intermediate layer of hBN. A graphite back gate and a local top gate allow to control the density and thereby the carrier wavelength in the upper-and lower layer individually. b) Using atomic force microscopy we measured the encapsulated hBN layer to be 3.5nm thick (sample A). c) Alternatively, the decoupling wavefunctions can be achieved by twisting two graphene layers (sample B). d) For large twist angles, the valleys in the upper/lower layer (Kt, K b ) are separated by a large momentum, leading to an effective electronic decoupling of the layers.The van-der-Waals stacking technique allows scientists to bring two conductive crystalline layers into atomically close proximity [1]. This has been exploited in a variety of experiments, including the formation of layer polarized, counter-propagating Landau levels [2] and experiments that build on strong capacitive coupling such as Coulomb-drag measurements [3] or interlayer exciton condensation [4,5].There are two main approaches of how to bring two conductive layers in close proximity, while suppressing an overlap of the layer wavefunctions: One approach introduces a thin layer of hexagonal Boron-Nitride (hBN) (see e.g. [3,4,6]) as depicted in Fig. 1a,b, and the other twists the layers by a large angle (θ > 5 • ) [2, 7-9]; see Fig. 1c,d. In the former case, decoupling is achieved by spatial separation. In the latter case, the layers are ultimately close, but they remain decoupled due to a large momentum mismatch (K t − K b ) between the upper and lower layer ( Fig. 1d). Experimental signatures of decoup...