Ellipsometry and structure studies of chromium, molybdenum, and platinum silicides

Lue, Juh Tzeng; Mu, Shean-Jyeh; Wu, I. C.

doi:10.1103/physrevb.36.1657

Cited by 13 publications

(6 citation statements)

References 9 publications

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“…This is at variance with the results obtained by us in [13] on thin films where we have found a direct gap of 1.05 eV. Moreover interband features have emerged at higher energies, whereas in [14] in this energy region a rather smooth variation of the optical constants with photon energy has been observed.…”

Section: Introductioncontrasting

confidence: 84%

“…The overall shape ofthe reflectivity spectrum reported by us in [13] for CrSi, films obtained by codeposition is verified. It exhibits much more structure in this energy region than that of [14]. Next, we make a first tentative assignment of the spectral features on the basis of the existing theoretical density of states (DOS) calculations.…”

Section: Optical Properties In the Near-ir And Visible Regionsmentioning

confidence: 98%

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Growth and Optical Characterization of CrSi₂ Thin Films

Lange

Giehler

Henrion

et al. 1992

Physica Status Solidi (b)

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CrSi, thin films are grown by dc magnetron sputtering of Cr single layers on Si and Cr/Si multi-layer configurations on SiO, and subsequent external annealing. In the optical spectra around the band edge the phonon emission and the absorption branches of the indirect transition at 0.5 eV and the direct transition around 1 eV can be discerned. Spectral features in the reflectivity spectrum at higher energies are discussed on the basis of published density of states calculations. The reflectivity spectrum in the IR region exhibits pronounced structures which can be fitted by a six-oscillator model yielding the TO frequencies, oscillator strengths, and damping constants of the lattice modes. The Raman spectrum shows bands in the 310 to 410 cm-' wave number region.Es wurden CrSi,-Schichten durch Gleichstrom-Magnetron-Sputtern von Cr-Einzelschichten auf Si und Cr/Si-Schichten auf SiO, und nachfolgender externer Temperung hergestellt. In den optischen Spektren im Bereich der Bandkante wurden die Phonon-Emissions-und Absorptions-Zweige des indirekten Ubergangs bei 0,5 eV sowie der direkte Ubergang bei 1 eV erhalten. Die spektrale Abhangigkeit des Reflexionsvermogens bei hoherer Energie wird auf der Grundlage existierender ZustandsdichteBerechnungen diskutiert. Das Reflexionsspektrum im IR-Bereich weist ausgepragte Strukturen auf, die mit Hilfe eines Modells bestehend aus sechs Oszillatoren angepa5t werden konnten, woraus die TO-Frequenzen, Oszillatorstarken und Dampfungskonstanten der Gitterschwingungen ermittelt wurden. Das Raman-Spektrum weist Banden im Wellenzahlbereich von 310 bis 410 cm-' auf.

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Section: Introductioncontrasting

confidence: 84%

Section: Optical Properties In the Near-ir And Visible Regionsmentioning

confidence: 98%

Growth and Optical Characterization of CrSi₂ Thin Films

Lange

Giehler

Henrion

et al. 1992

Physica Status Solidi (b)

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“…Metallic compounds such as magnesium diboride (MgB 2 ) are not discussed here due to their poor performance as plasmonic materials around optical frequencies [96][97][98][99][100]. Similarly, intermetallics such as silicides, which are reported to be plasmonic materials, will not be discussed owing to their large losses in the NIR and visible spectrum [101][102][103][104][105][106][107].…”

Section: Metallic Alloysmentioning

confidence: 99%

Searching for better plasmonic materials

West

Ishii

Naik

et al. 2010

Laser & Photonics Reviews

1,894

1,522

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Plasmonics is a research area merging the fields of optics and nanoelectronics by confining light with relatively large free-space wavelength to the nanometer scale -thereby enabling a family of novel devices. Current plasmonic devices at telecommunication and optical frequencies face significant challenges due to losses encountered in the constituent plasmonic materials. These large losses seriously limit the practicality of these metals for many novel applications. This paper provides an overview of alternative plasmonic materials along with motivation for each material choice and important aspects of fabrication. A comparative study of various materials including metals, metal alloys and heavily doped semiconductors is presented. The performance of each material is evaluated based on quality factors defined for each class of plasmonic devices. Most importantly, this paper outlines an approach for realizing optimal plasmonic material properties for specific frequencies and applications, thereby providing a reference for those searching for better plasmonic materials.

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“…Такi осциляцiї вказують на досить високий рiвень поглинання в областi поблизу забороненої зони й можуть бути поясненi модуляцiєю уявної частини дiелектричної провiдностi плiвок CrSi 2 [16]. Зазначимо, що спектральна залежнiсть кривих вiдбиття схожа з [17] для плiвок CrSi 2 , проте має набагато бiльш розвинену структуру в цiй областi енерґiй, нiж у [18].…”

Section: а) б)unclassified

Optical properties of Cr/Si(001) interfaces

Buchenko¹,

Goloborodko²

2016

J. Phys. Stud.

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Дослiджено вплив хрому на змiну оптичних характеристик iнтерфейсiв Cr/Si(001) за їх окислення. На основi експериментально вимiряних значень елiпсометричних параметрiв ρ i ∆ розраховано оптичну провiднiсть iнтерфейсiв, пов'язану з мiжзонними переходами, в iнтервалi вiд 1 до 4.5 еВ. Виявлено, що окислення суттєво впливає на оптичну провiднiсть плiвок хрому товщиною до 2 нм.Ключовi слова: елiпсометричнi параметри, оптична провiднiсть, окислення.

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Ellipsometry and structure studies of chromium, molybdenum, and platinum silicides

Cited by 13 publications

References 9 publications

Growth and Optical Characterization of CrSi₂ Thin Films

Growth and Optical Characterization of CrSi₂ Thin Films

Searching for better plasmonic materials

Optical properties of Cr/Si(001) interfaces

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Ellipsometry and structure studies of chromium, molybdenum, and platinum silicides

Cited by 13 publications

References 9 publications

Growth and Optical Characterization of CrSi2 Thin Films

Growth and Optical Characterization of CrSi2 Thin Films

Searching for better plasmonic materials

Optical properties of Cr/Si(001) interfaces

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Growth and Optical Characterization of CrSi₂ Thin Films

Growth and Optical Characterization of CrSi₂ Thin Films