2005
DOI: 10.1016/j.sse.2005.07.009
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Embedded EEPROM design in PD-SOI for application in an extended temperature range (−40°C up to 200°C)

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“…Above 150°C, leakage currents and reliability concerns in commercial bulk silicon platforms have prompted the move to silicon-on-insulator (SOI) or silicon-on-sapphire (SOS) processes for applications up to 300°C [6][7][8][9][10]. The other traditional approach has been to use wide bandgap (WBG) semiconductors such as SiC or GaN, which have been shown to be capable of operating at temperatures as high as 600°C [11][12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…Above 150°C, leakage currents and reliability concerns in commercial bulk silicon platforms have prompted the move to silicon-on-insulator (SOI) or silicon-on-sapphire (SOS) processes for applications up to 300°C [6][7][8][9][10]. The other traditional approach has been to use wide bandgap (WBG) semiconductors such as SiC or GaN, which have been shown to be capable of operating at temperatures as high as 600°C [11][12][13][14][15].…”
Section: Introductionmentioning
confidence: 99%