2014
DOI: 10.1109/mm.2014.96
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Embedded SRAM and Cortex-M0 Core Using a 60-nm Crystalline Oxide Semiconductor

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Cited by 14 publications
(11 citation statements)
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“…Due to the extremely low off‐state current ( I off ), metal‐oxide‐semiconductor field‐effect transistors (MOSFETs), including a crystalline oxide semiconductor CAAC‐IGZO (OSFET), can realize devices with significantly lower power consumption as compared to state‐of‐the‐art Si‐based devices. For instance, we have discovered that an OSFET with channel length ( L )/channel width ( W ) of 0.8 μm/100 mm demonstrates an extremely low I off of 6 yA/μm (10 −24 A/μm), which had not been achieved previously …”
Section: Introductionmentioning
confidence: 94%
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“…Due to the extremely low off‐state current ( I off ), metal‐oxide‐semiconductor field‐effect transistors (MOSFETs), including a crystalline oxide semiconductor CAAC‐IGZO (OSFET), can realize devices with significantly lower power consumption as compared to state‐of‐the‐art Si‐based devices. For instance, we have discovered that an OSFET with channel length ( L )/channel width ( W ) of 0.8 μm/100 mm demonstrates an extremely low I off of 6 yA/μm (10 −24 A/μm), which had not been achieved previously …”
Section: Introductionmentioning
confidence: 94%
“…As mentioned previously, CAAC‐IGZO has an extremely low I off. This feature helps realize memory that utilizes OSFETs with long retention time and a logic circuit with OSFETs that performs normally off operation; that is, the power is interrupted in a standby state …”
Section: Universal Memorymentioning
confidence: 99%
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“…OS-FETs have been applied to LSI as well as displays [8]. Examples of OS LSI in which nonvolatile memory elements are built with OS-FETs exhibiting ultralow off-state current include normally-off (N-off) processors [9][10][11], nonvolatile FPGAs (OS FPGA) [12][13][14][15][16], nonvolatile oxide semiconductor random access memory (NOSRAM) [17,18], dynamic oxide semiconductor random access memory (DOSRAM) [19], a global-shutter image sensor [20], and a vision sensor [21]. The possibility of device scaling has been verified [22], and prototyping of OS LSI using a foundry's 65-nm Si process has been reported previously [23,24].…”
Section: Introductionmentioning
confidence: 99%