1994
DOI: 10.1109/84.285721
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Emergent faces in crystal etching

Abstract: Abstruct-The time development of emergent faces in crystal etching is investigated. We present and discuss a novel computational approach, based on an intuitive geometrical derivation, for predicting an etched shape given an initial polygonal (mask) shape and a diagram of etch rate as a function of orientation. A two-dimensional geometric model is derived which determines the etched shape as a function of time. The model is both intuitive and easy to implement manually or by compter. Because the model is intui… Show more

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Cited by 41 publications
(23 citation statements)
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“…The A( 6 ) and V( 6 ) increase over time according to the following expressions (Hubbard and Antonsson, 1994):…”
Section: H ( T ) = T (8)mentioning
confidence: 99%
“…The A( 6 ) and V( 6 ) increase over time according to the following expressions (Hubbard and Antonsson, 1994):…”
Section: H ( T ) = T (8)mentioning
confidence: 99%
“…The first is based on physical behavior or mathematical models to accurately describe the detailed fabrication process. This method, exemplified by cellular automata (CA) (Fruhauf et al, 1993;Hubbard and Antonsson, 1994;Zhu and Liu, 2000), can provide detailed information but usually requires extensive computational effort and special algorithms, in addition to lack of process integration capability. Meanwhile, a second approach utilizing solid modeling is usually emphasized in terms of idealized global behavior (Osterberg and Senturia, 1995;DeVoe et al, 1998).…”
Section: Introductionmentioning
confidence: 99%
“…Several types of simulators for Si wet etching have been reported in the literature. Some are based on geometric considerations, such as the Wulff-Jaccodine method [1] and its variations, such as Eshapes [2]. However atomistic simulators based either on Kinetic Monte Carlo (KMC) or Cellular Automata (CA) have shown good results and wide applicability [3][4], leading to more precise simulations and allowing deeper analysis.…”
Section: Introductionmentioning
confidence: 99%